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  6. The ideal small plasma CVD device for research and prototyping: 'VC-R400G'

The ideal small plasma CVD device for research and prototyping: 'VC-R400G'

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VC-R Series

last updated:Jun 11, 2024

SCREENファインテックソリューションズ
SCREENファインテックソリューションズ
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Adopting a unique LIA method plasma source, we achieve ultra-fast, high-quality vacuum deposition on flat substrates such as glass and metal!

The "VC-R400G" is a plasma CVD device that employs a unique LIA (Low Inductance Antenna) plasma source, achieving ultra-fast and high-quality vacuum deposition on flat substrates such as glass and metal. It is suitable for experiments, research, evaluation, and prototyping. By using the LIA-type inductively coupled plasma (LIA-ICP), it realizes fast, high-precision, and low-damage vacuum deposition. With multi-point control, it ensures finer uniformity. It offers a variety of manual and automatic options. 【Features】 ■ Suitable for experiments, research, evaluation, and prototyping ■ Achieves fast, high-precision, and low-damage vacuum deposition ■ Ensures finer uniformity through multi-point control of LIA ■ Realizes ultra-fast deposition more than five times compared to conventional methods ■ A wide range of options available *For more details, please refer to the related links or feel free to contact us.

    CVD Equipment
VCR.PNG

The ideal small plasma CVD device for research and prototyping: 'VC-R400G'

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  • Related Link - https://www.screen.co.jp/ft/products/vc-r400gf

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basic information

■ Target substrates: Flat plates such as glass plates and metal plates 【Specifications (partial)】 - Target films: DLC, SiN, SiO, etc. - Film formation method: Deposition down, stationary film formation (inline film formation is also possible) - Temperature control: Stage temperature control < 500℃ *For more details, please refer to the related links or feel free to contact us.

Applications/Examples of results

【Applications】 ■DLC ■Functional film ■Surface modification ■Surface treatment ■Etching ■Ashing *For more details, please refer to the related links or feel free to contact us.

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VC-R400G ・Target substrates: flat plates such as glass plates and metal plates

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Plasma CVD device "VC-R400G/F"

Plasma CVD device "VC-R400G/F"

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SCREENファインテックソリューションズ

SCREENファインテックソリューションズ

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The SCREEN Group has celebrated its 80th anniversary. Since its establishment in 1943, we have received tremendous support from all of you, and on October 11, 2023, the SCREEN Group marked its 80th anniversary. We sincerely thank you. With the spirit of continuing to challenge creativity and development, we will continue to evolve.

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