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  6. The ideal small plasma CVD device for research and prototyping: 'VC-R400F'

The ideal small plasma CVD device for research and prototyping: 'VC-R400F'

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VC-R400F

last updated:Jun 11, 2024

SCREENファインテックソリューションズ
SCREENファインテックソリューションズ
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Adopting a unique LIA method plasma source, we achieve ultra-fast, high-quality vacuum deposition on resin films and metal foils!

The "VC-R400F" is a plasma CVD device that employs a unique LIA (Low Inductance Antenna) method plasma source, enabling ultra-fast and high-quality vacuum film deposition on resin films and metal foils. It is well-suited for experiments, research, evaluation, and prototyping. By using the LIA method of inductively coupled plasma (LIA-ICP), it achieves fast, high-precision, and low-damage vacuum film deposition. With multi-point control, it ensures finer uniformity. It offers a variety of manual, automatic, and optional features. 【Features】 ■ Well-suited for experiments, research, evaluation, and prototyping ■ Achieves fast, high-precision, and low-damage vacuum film deposition ■ Ensures finer uniformity through multi-point control of LIA ■ Realizes ultra-fast film deposition more than five times compared to conventional methods ■ A wide range of options available *For more details, please refer to the related links or feel free to contact us.

    CVD Equipment
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The ideal small plasma CVD device for research and prototyping: 'VC-R400F'

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  • Related Link - https://www.screen.co.jp/ft/products/vc-r400gf

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basic information

■ Target substrate: Resin film (PET, PEN), metal foil 【Specifications (partial)】 - Target films: DLC, SiN, SiO, etc. - Film formation method: Deposition down, stationary film formation (inline film formation also available) - Temperature control: Stage temperature control < 500℃ *For more details, please refer to the related links or feel free to contact us.

Applications/Examples of results

【Applications】 ■DLC ■Functional film ■Surface modification ■Surface treatment ■Etching ■Ashing *For more details, please refer to the related links or feel free to contact us.

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VC-R400F ・Target substrates: resin films (PET, PEN), metal foils

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Plasma CVD device "VC-R400G/F"

Plasma CVD device "VC-R400G/F"

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SCREENファインテックソリューションズ

SCREENファインテックソリューションズ

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The SCREEN Group has celebrated its 80th anniversary. Since its establishment in 1943, we have received tremendous support from all of you, and on October 11, 2023, the SCREEN Group marked its 80th anniversary. We sincerely thank you. With the spirit of continuing to challenge creativity and development, we will continue to evolve.

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