The ideal small sputtering device for research and prototyping: 'VS-R400G'

Ideal for experiments, research, evaluation, and prototype production! Achieving high-speed, high-precision, low-damage vacuum deposition on flat substrates such as glass and metal!

The "VS-R400G" is a sputtering device that adopts a unique LIA (Low Inductance Antenna) plasma source, achieving ultra-fast and high-quality vacuum deposition. Thanks to the assist effect of the LIA method's inductively coupled plasma (LIA-ICP), it reduces damage without lowering the deposition speed, resulting in high-quality film formation. Additionally, it can also accommodate reactive sputtering by leveraging the characteristics of high-density plasma. 【Features】 ■ A sputtering device suitable for experiments, research, evaluation, and prototyping ■ Reduces damage without lowering deposition speed, achieving high-quality film formation ■ Capable of reactive sputtering by utilizing the characteristics of high-density plasma ■ Enables faster deposition speeds by incorporating a rotary cathode ■ Easy to expand into production machines *For more details, please refer to the related links or feel free to contact us.

Sputtering Equipment