Research and development spatula device 'HSK602VTA'

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last updated：Feb 14, 2017

ハヤマ

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Achieving space-saving! A sputtering device optimal for the formation of alloy films and stacked films through simultaneous discharge.

The "HSK602VTA" is a sputtering device equipped with six small cathodes, each having its own shutter and power supply, making it ideal for the formation of alloy films and multilayer films through simultaneous discharge. It features a revolver-type 4-sample holder, allowing for film deposition under four different conditions with a single vacuum pump-down. Additionally, its compact design achieves space-saving benefits. 【Features】 ■ Compact design ■ 6 cathodes ■ Equipped with a revolver-type 4-sample holder ■ Capable of film deposition under four conditions at once *For more details, please refer to the catalog or feel free to contact us.

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basic information

【Specifications】 ■Cathode: DC φ2” Magnetron x 6 units ■Shutter mechanism: All individual shutters ■Sputtering DC power supply: 500mA x 6 independent units ■Substrate rotation: 10–30 rpm ■Substrate holder: Maximum φ2, 4 pieces ■Substrate heating: Maximum 600℃ ■Heating sample size: 20 × 20mm ■Flange: Electric up and down mechanism *For more details, please refer to the catalog or feel free to contact us.