マイクロセミコンダクターリサーチ Product Lineup

A wafer with multilayer deposition of Si epitaxy and SiGe epitaxy on a silicon substrate. The Ge content of SiGe can be specified arbitrarily.

• Wafer

We provide foundry wafer manufacturing services at various wafer levels, starting with test pattern wafers for 3D NAND flash memory. We have a track record of rare wafer deposition services, such as multilayer epitaxial wafers of Si epi and SiGe epi. We respond according to your requests.

• Wafer

We offer various structures specialized for MEMS applications. We mainly manufacture special SOI substrates, including SOI substrates ranging from 3 inches to 300 mm and SOI substrates with double active layers. Additionally, we always have over 1,000 types of SOI wafers in stock, and we accept orders for stock SOI wafers starting from one piece. 【Specifications】 ■ Active layer: 0.1μm to 200μm ■ Embedded oxide film: approximately up to 4μm ■ Support substrate: 100μm and above (depending on wafer size) *For more details, please download the PDF or feel free to contact us.

• Other semiconductors