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  3. プレテック 静岡製作所
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プレテック 静岡製作所

addressShizuoka/Yaizu-shi/Oshima 1143
phone054-623-3741
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last updated:Nov 07, 2025
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プレテック 静岡製作所 Product Lineup

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精密洗浄装置 精密洗浄装置
ファインシリーズ洗浄ユニット ファインシリーズ洗浄ユニット
ウルトラソニック洗浄ユニット​ ウルトラソニック洗浄ユニット​
スピンソニッククリーナー スピンソニッククリーナー
精密洗浄装置

精密洗浄装置

洗練された超音波洗浄ユニットにより、スーパークリーン洗浄を実現。 あらゆる精密部品・製品の洗浄工程で幅広く導入されている信頼性の高いシステムです。 タッチパネルなどの採用により、操作性・安全性・メンテナンス性がさらに向上。 またシステムの随所にハイグレードなパーツを使用して完成度を高めています。

Precision cleaning device

Achieving super clean cleaning with a sophisticated ultrasonic cleaning unit.

The "precision cleaning device" is a highly reliable system widely used in the cleaning processes of various precision parts and products. With the adoption of touch panels and other features, operability, safety, and maintainability have been further improved. Additionally, high-grade parts are used throughout the system to enhance its overall quality. The sophisticated ultrasonic cleaning unit achieves super clean cleaning. 【Applications】 ■ CD/LD master discs ■ Plastic lenses and optical lenses ■ Memory discs, aluminum/glass ■ LCD TFT/CF ■ Cases/cassettes *For more details, please refer to the related links or feel free to contact us.

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Disk cleaning device

Achieving high-quality cleaning through a combination of batch washing and brush cleaning.

Our company offers a "Disk Cleaning Device" that is highly effective for cleaning memory disks and LCD glass. By adopting a cassette-less system, we have achieved improved cleaning capability and energy savings. The batch cleaning section can be selected from our wide variety of ultrasonic cleaning units according to the application, allowing for particle removal at the appropriate frequency without causing damage. [Features] - The adoption of a cassette-less system enables both batch cleaning and brush cleaning in a single device. - The brush cleaning section uses a sand scrub method, allowing for simultaneous cleaning of both sides. - The combination of the batch cleaning unit and brush cleaning unit is flexible. *For more details, please refer to the related links or feel free to contact us.

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Cassette-less cleaning device

Achieving a high level of both quality and energy efficiency. Cleaner with a smaller amount of solution in the tank.

The "cassette-less cleaning device" is a product that allows for smooth robot transport without chipping and significantly reduces running costs. It uses Fine Sonic (high-frequency oscillator/transducer) to remove particles without causing damage. By adopting various super clean technologies, it resolves all the issues related to cassettes in cleaning. 【Features】 ■ Eliminates uneven cleaning in cassette contact areas ■ Achieves greater cleanliness with a smaller amount of cleaning solution in the tank ■ Significantly reduces power consumption ■ Minimizes the amount of cleaning solution during inter-tank transfers *For more details, please refer to the related links or feel free to contact us.

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Spin Sonic Cleaner

Simultaneous non-contact cleaning of both sides of the wafer, even for submicron particles.

Introducing the "SpinSonic Cleaner," which achieves high cleaning capability through the adoption of a wafer horizontal placement and sheet-fed fine jet method. It can remove sub-micron particles, reduce the number of processes, and eliminate the need for chemical management and heaters. It demonstrates excellent performance that enables a reduction in cleaning time and savings in running costs. 【Features】 - High cleaning capability achieved with chemical-compatible fine jets and 400kHz fine jets - Maintenance-free and damage-free cleaning through non-contact (brushless) cleaning - Capability to perform all cleaning and drying processes in one stage - No need for heaters due to a completely ambient temperature process, significantly reducing power consumption - Compact installation area and high layout flexibility achieved through function-specific unit configuration *For more details, please refer to the related links or feel free to contact us.

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Spin cleaning unit for corner substrates and photomasks

Compatible with square substrates such as photomask substrates. Achieves integrated processing within the same unit, from cleaning solution supply from both the top and bottom sides to drying through high-speed rotation.

This product is a spin cleaning unit designed to efficiently clean and dry square-shaped substrates (square substrates), including photomask substrates. ■ Cleaning process specialized for square substrates It provides stable spin cleaning for square substrates, which are generally considered difficult to process with rotation. It is primarily designed for photomask substrates of size 152×152mm, but it can accommodate various sizes of square substrates. ■ Complete process from cleaning to drying in one unit The drying process, using high-speed rotation, is performed within the same unit following the cleaning process. This allows for the completion of the entire series of processes without moving the substrate, contributing not only to a reduction in takt time but also to a decrease in the risk of recontamination during movement, thereby maintaining high cleaning quality. *For more details, please download the catalog or feel free to contact us.

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