SPUTTERCORE CO.,LTD. Product Lineup

In the metalworking industry, the durability and precision of tools are crucial factors that influence production efficiency and product quality. Especially for tools exposed to high temperatures and heavy loads, wear resistance and heat resistance of materials are essential. Improper material selection can lead to premature wear or damage of tools, potentially resulting in decreased productivity. Our tungsten (W) targets are of high purity and possess excellent properties, allowing them to perform exceptionally well in tool manufacturing. 【Application Scenarios】 - Tools requiring wear resistance - Tools requiring heat resistance - Tools requiring high precision machining 【Benefits of Implementation】 - Extended tool lifespan - Improved machining accuracy - Enhanced production efficiency

• Other metal materials

In the electronic components industry, the bonding process is a crucial factor that affects product reliability. Particularly for electronic components exposed to high temperatures and vibrations, the quality of the joints significantly influences product lifespan. Poor bonding can lead to decreased performance and early failure of the product. Our tungsten (W) targets achieve high-quality bonding and contribute to the improvement of electronic component reliability. 【Application Scenarios】 - Bonding of semiconductor devices - Bonding of electronic circuit boards - Electrode formation for electronic components 【Benefits of Implementation】 - High-quality bonding with high-purity tungsten - Improved reliability of joints through uniform film formation - Ability to meet diverse bonding needs with W alloy targets

• Other metal materials

In experiments conducted at research institutions, obtaining high-precision data is crucial. Particularly in sputtering experiments, the quality of the target material significantly affects the experimental results. Contamination and lack of uniformity can compromise the reliability of the experimental data. Our tungsten (W) targets are of high purity (≧5N), contributing to enhanced reproducibility of experiments. 【Application Scenarios】 - Sputtering experiments - Thin film formation experiments - Material property evaluation 【Benefits of Implementation】 - Acquisition of reliable experimental data with high-purity materials - Improvement of experimental accuracy through uniform film thickness formation - Adaptability to various experiments with W alloy targets

• Other metal materials

In the optical industry, the quality of reflective materials is a crucial factor that influences optical performance. Particularly in high-precision optical devices and laser systems, uniformity, high purity, and durability of the reflective surface are required. Inappropriate reflective materials can cause light scattering and absorption, potentially leading to a decline in system performance. Our tungsten (W) targets address these challenges and contribute to the enhancement of optical performance. 【Use Cases】 - High-precision optical devices - Laser systems - Reflective mirrors - Optical coatings 【Benefits of Implementation】 - High reflectivity due to high-purity tungsten - Achievement of uniform film thickness and surface roughness - Increased durability leading to longer lifespan - Improvement in optical performance

• Other metal materials

In the energy industry, especially in applications that require corrosion resistance, the durability of materials is extremely important. Selecting materials that can withstand harsh environments is essential for ensuring the long-term reliability and safety of products. Tungsten (W) targets provide excellent corrosion resistance and contribute to the stable operation of energy-related equipment. 【Application Scenarios】 - Use in corrosive environments - Use in high-temperature environments - Applications requiring high durability 【Benefits of Implementation】 - Prolonged equipment lifespan - Reduced maintenance costs - Stable performance maintenance

• Other metal materials

In the automotive industry, electrode applications require high durability and reliability. Electrodes must withstand high-temperature environments and heavy loads, and their performance directly affects product quality. Inappropriate electrode materials can lead to performance degradation and failures, potentially shortening the product's lifespan. Our tungsten (W) targets are manufactured with high purity, making them ideal materials for electrode applications. 【Usage Scenarios】 - Electrode manufacturing through sputtering - Electrode components requiring high durability and high reliability 【Benefits of Implementation】 - Improved durability of electrodes - Enhanced product quality - Long-term cost reduction

• Other metal materials

In the aerospace industry, the durability of components under high-temperature conditions is essential. Particularly for heat-resistant components such as rocket engines and aircraft turbine blades, it is crucial to prevent material degradation and maintain performance over extended periods. Improper material selection can lead to component failure or performance deterioration. Our tungsten (W) targets are of high purity and possess excellent heat resistance. The sputtering technology enables uniform film formation, contributing to the manufacturing of heat-resistant components in the aerospace field. 【Application Scenarios】 - Rocket engine nozzles - Coatings for aircraft turbine blades - Heat shields for space exploration vehicles 【Benefits of Implementation】 - Increased lifespan of components in high-temperature environments - Achievement of high heat resistance and durability - Uniform film formation through sputtering

• Other metal materials

In the medical device industry, particularly in X-ray systems, high-precision imaging diagnostics are required. The quality of the target material, which serves as the X-ray source, is crucial as it directly affects the clarity of the images and the accuracy of the diagnosis. Contamination by impurities or a lack of uniformity in the target material can degrade the quality of the X-rays and compromise diagnostic accuracy. Our tungsten (W) targets contribute to the performance enhancement of X-ray systems by providing high purity and uniform quality. 【Usage Scenarios】 - X-ray diagnostic equipment - CT scans - Dental X-ray equipment - Industrial X-ray inspection equipment 【Benefits of Implementation】 - Achievement of high-quality X-ray images - Improvement in diagnostic accuracy - Increased longevity of equipment

• Other metal materials

In the display industry, thin film formation technology is a crucial factor that influences product performance and quality. In particular, to enhance the display performance, the formation of uniform and high-quality thin films is essential. The use of inappropriate target materials can degrade the quality of the thin films and negatively impact the brightness and contrast of the display. Our tungsten (W) targets enable the formation of high-purity and uniform thin films, contributing to the high performance of displays. 【Application Scenarios】 - Thin film formation in display manufacturing - High-definition displays, organic EL displays, liquid crystal displays - Thin film formation through sputtering 【Benefits of Implementation】 - Improved display performance through high-quality thin film formation - Uniform film thickness and high adhesion - Increased yield and cost reduction

• Other metal materials

In the semiconductor industry, sputtering is essential for the formation of high-quality thin films. Particularly as integration increases, the purity and uniformity of the target material become critical factors that influence device performance. Contamination by impurities and variations in film thickness can lead to reduced product yield and reliability issues. Our tungsten (W) targets achieve high purity (≧5N) and improve sputtering efficiency, addressing these challenges. 【Usage Scenarios】 - Thin film formation in semiconductor manufacturing - Manufacturing of high-density devices - Formation of metal films through sputtering 【Benefits of Implementation】 - Improved device performance through high-quality thin film formation - Enhanced yield - Realization of reliable products

• Other metal materials

In experiments conducted at research institutions, the purity and uniformity of materials significantly impact the results. Particularly in thin film formation experiments, the quality of the target material is crucial, as contamination by impurities or lack of uniformity can compromise the reproducibility of the experiments. Our hafnium (Hf) target achieves high purity and uniformity, contributing to the reliability of experiments. 【Application Scenes】 - Thin film formation experiments - Material property evaluation experiments - Sputtering experiments 【Effects of Introduction】 - Improved reliability of experimental data - Enhanced reproducibility of experiments - Formation of high-quality thin films

• Other metal materials

In the optical lens industry, high transmittance and durability are required. Particularly for lenses exposed to ultraviolet light and high-temperature environments, the purity and uniformity of the materials are essential for maintaining lens performance. Inappropriate materials or manufacturing processes can lead to degradation of lens performance and a decrease in lifespan. Our high-purity Hf target contributes to the improvement of optical lens performance due to its high purity and uniformity. 【Application Scenarios】 - Optical lens manufacturing - Coating - Sputtering 【Benefits of Implementation】 - Improved lens transmittance - Enhanced lens durability - Increased stability of film formation

• Other metal materials

In the measurement equipment industry, particularly in the sensor field, high precision measurements and stable performance are required. The performance of sensors is greatly influenced by the quality of the materials used, with the purity and uniformity of the target materials used for thin film formation being especially important. Contamination by impurities and non-uniformity in film thickness can lead to reduced sensitivity and malfunctions in sensors. Our high-purity Hf targets address these challenges and contribute to the improvement of sensor reliability. 【Application Scenarios】 - High-precision sensors - Environmental measurement equipment - Medical sensors 【Benefits of Implementation】 - Improved sensor performance with high-purity materials - Enhanced stability through uniform thin film formation - Elimination of internal defects through UT inspection

• Other metal materials

In the energy sector, particularly in areas such as fuel cells, high-quality materials are required to enhance performance and durability. Hafnium (Hf) targets hold the potential to meet these demands. High-purity Hf targets ensure stability and consistency in thin film deposition, contributing to improved performance of fuel cells. 【Application Scenarios】 - Fuel cells - Energy storage devices 【Benefits of Implementation】 - Improved energy efficiency - Increased device longevity

• Other metal materials

In the display industry, thin film formation technology significantly influences product performance. In particular, high-quality thin film formation using sputtering technology requires high-purity Hf targets. The purity and uniformity of Hf targets greatly impact the display's visual performance and durability. Our products provide high-purity Hf targets, contributing to the quality enhancement of our customers' display products. 【Usage Scenarios】 - Sputtering process in display manufacturing - Thin Film Transistor (TFT) manufacturing - Touch panel manufacturing 【Effects of Implementation】 - Improved display performance through high-quality thin film formation - Enhanced product durability - Improved yield

• Other metal materials

In the chemical industry, the purity and uniformity of catalyst materials are crucial for enhancing reaction efficiency. In particular, high-purity Hf targets have the potential to improve the selectivity and activity of catalytic reactions. Our high-purity Hf targets achieve stability and reproducibility in catalytic reactions due to their high purity and uniformity. 【Application Scenarios】 - Research and development of catalyst materials - Manufacturing of high-performance catalysts - Optimization of chemical reaction processes 【Benefits of Implementation】 - Improved catalyst performance - Enhanced reaction efficiency - Stabilization of product quality

• Other metal materials

In the electronic components industry, the performance of dielectric films is a crucial factor that affects the reliability of products. Particularly, as miniaturization progresses, the uniformity of thin films, high purity, and absence of internal defects are required. Hf targets contribute to the improvement of electronic component performance by meeting these demands. 【Application Scenarios】 - Formation of dielectric films - Capacitors, memory devices - Thin-film transistors 【Effects of Implementation】 - Improved dielectric properties due to high purity - Stabilization of performance through uniform film thickness - Enhanced reliability by eliminating internal defects

• Other metal materials

In the medical industry, the quality of contrast agents is directly linked to diagnostic accuracy and is a crucial factor that affects patient health. To maximize the performance of contrast agents, the selection of high-quality materials is essential. Our hafnium (Hf) targets achieve high purity and uniformity, contributing to quality improvement in the manufacturing process of contrast agents. [Application Scenarios] - Contrast agent manufacturing [Effects of Introduction] - Improvement in the quality of contrast agents - Enhancement of diagnostic accuracy

• Other metal materials

In the aerospace industry, the durability of materials under high-temperature conditions is crucial. Particularly for rocket and aircraft engine components, heat resistance and stability are required. Hafnium (Hf) targets have been developed to meet these demands. 【Application Scenarios】 - Rocket nozzles - Aircraft engine components - Heat-resistant coatings 【Benefits of Introduction】 - Improved heat resistance - Stability of thin film deposition - Extended product lifespan

• Other metal materials

In the nuclear power industry, control rods are essential for the safe operation of reactors. The performance of control rods is directly linked to the adjustment of reactor output and safety, which requires high reliability in their constituent materials. Hafnium (Hf) is important as a material for control rods due to its excellent neutron absorption capability. Our high-purity Hf targets achieve high safety and efficiency in the manufacturing of control rods. [Application Scenarios] - Nuclear power plants - Research reactors [Effects of Implementation] - Contributes to the safe operation of reactors - Efficient control due to high neutron absorption capability - Ensures long-term reliability

• Other metal materials

In the semiconductor industry, the quality of thin films is becoming increasingly important as devices become more high-performance. In particular, when forming thin films using Hf (hafnium) targets, the purity and uniformity of the target material significantly influence the properties of the thin films. Contamination by impurities and variations in crystal grain size can lead to a decrease in the reliability of the thin films. Our high-purity Hf targets support the formation of high-quality thin films. 【Application Scenarios】 - Thin film formation in semiconductor manufacturing - Production of Hf thin films through sputtering - Manufacturing of high-performance devices 【Benefits of Implementation】 - Achievement of high-quality thin films - Improvement in device performance - Enhancement of yield

• Other metal materials

In the semiconductor industry, there is a demand for finer and higher-quality wiring. To enhance the reliability of wiring, the purity and conductivity of materials are crucial. Inappropriate materials or manufacturing processes can lead to wire breakage or performance degradation. Our tin (Sn) target contributes to the high quality of semiconductor wiring due to its high purity and excellent conductivity. 【Application Scenarios】 - Wiring formation in semiconductor manufacturing - Production of ITO thin films 【Benefits of Implementation】 - Improved wiring reliability with high-purity materials - Enhanced performance due to excellent conductivity - Increased yield through uniform film formation

• Other metal materials

■ Purity: 99.9% ~ 99.999% ■ Density (16.6 g/cm³) ■ Applications 　 Thin film formation; superconducting materials; heat and corrosion resistant applications *For more details, please download the PDF or feel free to contact us.

• Steel
• Other metal materials

■Purity>99.9999999% ■ Density (2.33/cm ³) *For more details, please download the PDF or feel free to contact us.

• Other polymer materials

■ Purity > 99.9999% ■ Density (2.33/cm³) ■ Manufacturing methods: Melting method and sintering method *For more details, please download the PDF or feel free to contact us.

• Other polymer materials
• Composite Materials

■ Purity > 99.99% ■ Density (6.67g/cm³) * For more details, please download the PDF or feel free to contact us.

• stainless
• Fine Ceramics

For more details, please download the PDF or feel free to contact us.

• Rare metals
• Other metal materials

■ Purity > 99.9% ■ Density (4.26 g/cm³) ■ HP Process *For more details, please download the PDF or feel free to contact us.*

• Composite Materials
• Other metal materials

■ Purity > 99.9% ■ Density (4.49 g/cm³) ■ Manufacturing Method: HIP *For more details, please download the PDF or feel free to contact us.*

• Other metal materials
• Composite Materials

■ Purity > 99.99% ■ Density (7.15/cm³) ■ Manufacturing method: Sintering method, HP method * For more details, please download the PDF or feel free to contact us.

• Fine Ceramics
• Composite Materials

■Purity > 99.99% ■ Density (7.15/cm³) ■ Manufacturing method: Sintering method, HP method *For more details, please download the PDF or feel free to contact us.*

• Fine Ceramics
• Composite Materials

■ Purity > 99.9% ■ Density (3.95 g/cm³) ■ Manufacturing method: Powder metallurgy *For more details, please download the PDF or feel free to contact us.

• aluminum
• Composite Materials

■ Purity: 99.9% ■ Density (8.9 g/cm³) ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.

• alloy

■ Purity: 99.5% - 99.95% ■ Density (8.4 g/cm³) ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.

• alloy

■ Purity: 99.5% ~ 99.9% ■ Density (8.4 g/cm³) ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.

• alloy

■ Purity: 99.95% ■ Density (19.3 g/cm³) ■ Manufacturing Method: Powder metallurgy *For more details, please download the PDF or feel free to contact us.*

• alloy

■ Purity > 99.99% ■ Density (7.15/cm³) ■ Manufacturing Method: Sintering method, HP method *For more details, please download the PDF or feel free to contact us.

• Ceramics
• Fine Ceramics

■ Purity: 99.95% ■ Density (2.72 g/cm³) ■ Usable AlNd ratios (wt%): 90:10; 94:6; 98:2, etc. ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.*

• aluminum
• alloy

■Al, Ti ratio tolerance:+/-0.3wt% ■Segment difference possible ■Surface finish<Ra1.6a ■No scars, no broken edges *For more details, please download the PDF or feel free to contact us.

• aluminum
• alloy

For more details, please download the PDF or feel free to contact us.

• aluminum
• Other metal materials

■ Used for etching machine ■ Frosted finish ■ No Black spots on the surface

• Other metal materials

■ Purity: 99.97% ■ Density (8.9 g/cm³) ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.

• alloy

■ Purity > 98.0% ■ Density (8.9 g/cm³) ■ Manufacturing method: Vacuum melting method * For more details, please download the PDF or feel free to contact us.

• alloy

■ Each Ratios (90:10; 95:5; 97:3) ■ Manufacturing method: Powder metallurgy *For more details, please download the PDF or feel free to contact us.

• Ceramics

■Export license: Zirconium (Zr) targets are restricted to export from China and are difficult to obtain, but We are always shipping from the application to the permission law. ■Main characteristics: Warp Zirconium (Zr) target is easy to warp and it is hard to fix the sled. ■Guarantee Including warp inspection GDMS 100% inspection of purity *For more details, please download the PDF or feel free to contact us.

• Other metal materials