SPUTTERCORE CO.,LTD. List of Products and Services

In the optical lens industry, high transmittance and durability are required. Particularly for lenses exposed to ultraviolet light and high-temperature environments, the purity and uniformity of the materials are essential for maintaining lens performance. Inappropriate materials or manufacturing processes can lead to degradation of lens performance and a decrease in lifespan. Our high-purity Hf target contributes to the improvement of optical lens performance due to its high purity and uniformity. 【Application Scenarios】 - Optical lens manufacturing - Coating - Sputtering 【Benefits of Implementation】 - Improved lens transmittance - Enhanced lens durability - Increased stability of film formation

• Other metal materials

In the measurement equipment industry, particularly in the sensor field, high precision measurements and stable performance are required. The performance of sensors is greatly influenced by the quality of the materials used, with the purity and uniformity of the target materials used for thin film formation being especially important. Contamination by impurities and non-uniformity in film thickness can lead to reduced sensitivity and malfunctions in sensors. Our high-purity Hf targets address these challenges and contribute to the improvement of sensor reliability. 【Application Scenarios】 - High-precision sensors - Environmental measurement equipment - Medical sensors 【Benefits of Implementation】 - Improved sensor performance with high-purity materials - Enhanced stability through uniform thin film formation - Elimination of internal defects through UT inspection

• Other metal materials

In the energy sector, particularly in areas such as fuel cells, high-quality materials are required to enhance performance and durability. Hafnium (Hf) targets hold the potential to meet these demands. High-purity Hf targets ensure stability and consistency in thin film deposition, contributing to improved performance of fuel cells. 【Application Scenarios】 - Fuel cells - Energy storage devices 【Benefits of Implementation】 - Improved energy efficiency - Increased device longevity

• Other metal materials

In the display industry, thin film formation technology significantly influences product performance. In particular, high-quality thin film formation using sputtering technology requires high-purity Hf targets. The purity and uniformity of Hf targets greatly impact the display's visual performance and durability. Our products provide high-purity Hf targets, contributing to the quality enhancement of our customers' display products. 【Usage Scenarios】 - Sputtering process in display manufacturing - Thin Film Transistor (TFT) manufacturing - Touch panel manufacturing 【Effects of Implementation】 - Improved display performance through high-quality thin film formation - Enhanced product durability - Improved yield

• Other metal materials

In the chemical industry, the purity and uniformity of catalyst materials are crucial for enhancing reaction efficiency. In particular, high-purity Hf targets have the potential to improve the selectivity and activity of catalytic reactions. Our high-purity Hf targets achieve stability and reproducibility in catalytic reactions due to their high purity and uniformity. 【Application Scenarios】 - Research and development of catalyst materials - Manufacturing of high-performance catalysts - Optimization of chemical reaction processes 【Benefits of Implementation】 - Improved catalyst performance - Enhanced reaction efficiency - Stabilization of product quality

• Other metal materials

In the electronic components industry, the performance of dielectric films is a crucial factor that affects the reliability of products. Particularly, as miniaturization progresses, the uniformity of thin films, high purity, and absence of internal defects are required. Hf targets contribute to the improvement of electronic component performance by meeting these demands. 【Application Scenarios】 - Formation of dielectric films - Capacitors, memory devices - Thin-film transistors 【Effects of Implementation】 - Improved dielectric properties due to high purity - Stabilization of performance through uniform film thickness - Enhanced reliability by eliminating internal defects

• Other metal materials

In the medical industry, the quality of contrast agents is directly linked to diagnostic accuracy and is a crucial factor that affects patient health. To maximize the performance of contrast agents, the selection of high-quality materials is essential. Our hafnium (Hf) targets achieve high purity and uniformity, contributing to quality improvement in the manufacturing process of contrast agents. [Application Scenarios] - Contrast agent manufacturing [Effects of Introduction] - Improvement in the quality of contrast agents - Enhancement of diagnostic accuracy

• Other metal materials

In the aerospace industry, the durability of materials under high-temperature conditions is crucial. Particularly for rocket and aircraft engine components, heat resistance and stability are required. Hafnium (Hf) targets have been developed to meet these demands. 【Application Scenarios】 - Rocket nozzles - Aircraft engine components - Heat-resistant coatings 【Benefits of Introduction】 - Improved heat resistance - Stability of thin film deposition - Extended product lifespan

• Other metal materials

In the nuclear power industry, control rods are essential for the safe operation of reactors. The performance of control rods is directly linked to the adjustment of reactor output and safety, which requires high reliability in their constituent materials. Hafnium (Hf) is important as a material for control rods due to its excellent neutron absorption capability. Our high-purity Hf targets achieve high safety and efficiency in the manufacturing of control rods. [Application Scenarios] - Nuclear power plants - Research reactors [Effects of Implementation] - Contributes to the safe operation of reactors - Efficient control due to high neutron absorption capability - Ensures long-term reliability

• Other metal materials

In the semiconductor industry, the quality of thin films is becoming increasingly important as devices become more high-performance. In particular, when forming thin films using Hf (hafnium) targets, the purity and uniformity of the target material significantly influence the properties of the thin films. Contamination by impurities and variations in crystal grain size can lead to a decrease in the reliability of the thin films. Our high-purity Hf targets support the formation of high-quality thin films. 【Application Scenarios】 - Thin film formation in semiconductor manufacturing - Production of Hf thin films through sputtering - Manufacturing of high-performance devices 【Benefits of Implementation】 - Achievement of high-quality thin films - Improvement in device performance - Enhancement of yield

• Other metal materials

In the semiconductor industry, there is a demand for finer and higher-quality wiring. To enhance the reliability of wiring, the purity and conductivity of materials are crucial. Inappropriate materials or manufacturing processes can lead to wire breakage or performance degradation. Our tin (Sn) target contributes to the high quality of semiconductor wiring due to its high purity and excellent conductivity. 【Application Scenarios】 - Wiring formation in semiconductor manufacturing - Production of ITO thin films 【Benefits of Implementation】 - Improved wiring reliability with high-purity materials - Enhanced performance due to excellent conductivity - Increased yield through uniform film formation

• Other metal materials

■ Purity: 99.9% ~ 99.999% ■ Density (16.6 g/cm³) ■ Applications 　 Thin film formation; superconducting materials; heat and corrosion resistant applications *For more details, please download the PDF or feel free to contact us.

• Steel
• Other metal materials

■Purity>99.9999999% ■ Density (2.33/cm ³) *For more details, please download the PDF or feel free to contact us.

• Other polymer materials

■ Purity > 99.9999% ■ Density (2.33/cm³) ■ Manufacturing methods: Melting method and sintering method *For more details, please download the PDF or feel free to contact us.

• Other polymer materials
• Composite Materials

■ Purity > 99.99% ■ Density (6.67g/cm³) * For more details, please download the PDF or feel free to contact us.

• stainless
• Fine Ceramics

For more details, please download the PDF or feel free to contact us.

• Rare metals
• Other metal materials

■ Purity > 99.9% ■ Density (4.26 g/cm³) ■ HP Process *For more details, please download the PDF or feel free to contact us.*

• Composite Materials
• Other metal materials

■ Purity > 99.9% ■ Density (4.49 g/cm³) ■ Manufacturing Method: HIP *For more details, please download the PDF or feel free to contact us.*

• Other metal materials
• Composite Materials

■ Purity > 99.99% ■ Density (7.15/cm³) ■ Manufacturing method: Sintering method, HP method * For more details, please download the PDF or feel free to contact us.

• Fine Ceramics
• Composite Materials

■Purity > 99.99% ■ Density (7.15/cm³) ■ Manufacturing method: Sintering method, HP method *For more details, please download the PDF or feel free to contact us.*

• Fine Ceramics
• Composite Materials

■ Purity > 99.9% ■ Density (3.95 g/cm³) ■ Manufacturing method: Powder metallurgy *For more details, please download the PDF or feel free to contact us.

• aluminum
• Composite Materials

■ Purity: 99.9% ■ Density (8.9 g/cm³) ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.

• alloy

■ Purity: 99.5% - 99.95% ■ Density (8.4 g/cm³) ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.

• alloy

■ Purity: 99.5% ~ 99.9% ■ Density (8.4 g/cm³) ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.

• alloy

■ Purity: 99.95% ■ Density (19.3 g/cm³) ■ Manufacturing Method: Powder metallurgy *For more details, please download the PDF or feel free to contact us.*

• alloy

■ Purity > 99.99% ■ Density (7.15/cm³) ■ Manufacturing Method: Sintering method, HP method *For more details, please download the PDF or feel free to contact us.

• Ceramics
• Fine Ceramics

■ Purity: 99.95% ■ Density (2.72 g/cm³) ■ Usable AlNd ratios (wt%): 90:10; 94:6; 98:2, etc. ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.*

• aluminum
• alloy

■Al, Ti ratio tolerance:+/-0.3wt% ■Segment difference possible ■Surface finish<Ra1.6a ■No scars, no broken edges *For more details, please download the PDF or feel free to contact us.

• aluminum
• alloy

For more details, please download the PDF or feel free to contact us.

• aluminum
• Other metal materials

■ Used for etching machine ■ Frosted finish ■ No Black spots on the surface

• Other metal materials

■ Purity: 99.97% ■ Density (8.9 g/cm³) ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.

• alloy

■ Purity > 98.0% ■ Density (8.9 g/cm³) ■ Manufacturing method: Vacuum melting method * For more details, please download the PDF or feel free to contact us.

• alloy

■ Each Ratios (90:10; 95:5; 97:3) ■ Manufacturing method: Powder metallurgy *For more details, please download the PDF or feel free to contact us.

• Ceramics

■Export license: Zirconium (Zr) targets are restricted to export from China and are difficult to obtain, but We are always shipping from the application to the permission law. ■Main characteristics: Warp Zirconium (Zr) target is easy to warp and it is hard to fix the sled. ■Guarantee Including warp inspection GDMS 100% inspection of purity *For more details, please download the PDF or feel free to contact us.

• Other metal materials

■It is often shipped for semiconductor including touch panel ■Planner target Width 2000 mm, length mm Possible ■Rotary target OD176*ID125*3100ｍｍⅬ 　Highest shipment record of 400MT/Y ■We can also produce Backing plate *For more details, please download the PDF or feel free to contact us.

• Other metal materials

■Purity: Each type purity is possible ■Shape: Planner target Rotary target Any abnormal form target ■Titanium alloy target Thin film characteristics such as hardness and conductivity can be adjusted *For more details, please download the PDF or feel free to contact us.

• Other metal materials

■High Purity 　Using in the semiconductor industry. ■Density 　High density and uniformity ■Nickel alloys are also available 　NiCr, NiTi, NiCu, NiCuTi *For more details, please download the PDF or feel free to contact us.

• Other metal materials

■High-purity Hf target Application in the semiconductor industry GDMS with purity measurement values Under the regulatory environment, strictly follow the laws of each country and apply for a license to export ■ Available for civilian use *For more details, please download the PDF or feel free to contact us.

• Other metal materials

■Purity: 2N5-3N8 Manufacturing method: HIP ■ High hardness ■ Strong abrasion resistance *For more details, please download the PDF or feel free to contact us.

• Other metal materials

■Tantalum target materials are often used in PVD and CVD coating processes ■High temperature resistance and strong corrosion resistance ■High density Can be used for high-intensity sputtering, with high film deposition efficiency ■Good conductivity *For more details, please download the PDF or feel free to contact us.

• Other metal materials

■ High purity Purity≧99.99% (4N)　 High purity requirements for materials such as semiconductors and optical films ■ Good conductivity Tin (Sn) has excellent conductivity and is suitable for the production of transparent conductive films such as ITO thin films *For more details, please download the PDF or feel free to contact us.

• Other metal materials

■ Four sides C processing ■ Controllable surface roughness ■ Internal Grain Size can be customized according to customer requirements ■ Configurable Import License ■ Experience in supplying semiconductor companies *For more details, please download the PDF or feel free to contact us.

• Other metal materials

■High purity semiconductor W Target ■Powder metallurgy method for manufacturing ■Various Tungsten alloy target materials *For more details, please download the PDF or feel free to contact us.

• Other metal materials