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  3. SPUTTERCORE CO.,LTD.
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Electronic Components and Semiconductors
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SPUTTERCORE CO.,LTD.

Establishment25/Dec/2025
capital1000Ten thousand
addressOsaka/Yodogawa-ku, Osaka-shi/Room 707, 2nd Shin-Osaka Building, 6-3-32 Nishi-Nakajima
phone06-6732-9818
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last updated:Nov 10, 2025
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SPUTTERCORE CO.,LTD. Product Lineup

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91~99 item / All 99 items

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金属ターゲット  金属ターゲット 
合金ターゲット 合金ターゲット
セラミックターゲット セラミックターゲット
酸化物ターゲット 酸化物ターゲット
当社の誇る製品 当社の誇る製品
class="retina-image"

Copper (Cu) target

Copper (Cu) target Purity: 3 N7~6N Crystal 40-80 um C18200 C18150 Handling

■It is often shipped for semiconductor including touch panel ■Planner target Width 2000 mm, length mm Possible ■Rotary target OD176*ID125*3100mmⅬ  Highest shipment record of 400MT/Y ■We can also produce Backing plate *For more details, please download the PDF or feel free to contact us.

  • Other metal materials

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Titanium Ti Target Purity≧5N5

Titanium Ti Target, Each type purity is possible

■Purity: Each type purity is possible ■Shape: Planner target Rotary target Any abnormal form target ■Titanium alloy target Thin film characteristics such as hardness and conductivity can be adjusted *For more details, please download the PDF or feel free to contact us.

  • Other metal materials

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Nickel (Ni) target Purity>4N5

Nickel (Ni) target Purity2N~4N5

■High Purity  Using in the semiconductor industry. ■Density  High density and uniformity ■Nickel alloys are also available  NiCr, NiTi, NiCu, NiCuTi *For more details, please download the PDF or feel free to contact us.

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Hafnium (Hf) target

Hafnium (Hf) target Purity>4N5

■High-purity Hf target Application in the semiconductor industry GDMS with purity measurement values Under the regulatory environment, strictly follow the laws of each country and apply for a license to export ■ Available for civilian use *For more details, please download the PDF or feel free to contact us.

  • Other metal materials

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Chromium (Cr) target

Chromium (Cr) target Purity>3N8

■Purity: 2N5-3N8 Manufacturing method: HIP ■ High hardness ■ Strong abrasion resistance *For more details, please download the PDF or feel free to contact us.

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Tantalum (Ta) Target

Tantalum (Ta) Target Purity>5N

■Tantalum target materials are often used in PVD and CVD coating processes ■High temperature resistance and strong corrosion resistance ■High density Can be used for high-intensity sputtering, with high film deposition efficiency ■Good conductivity *For more details, please download the PDF or feel free to contact us.

  • Other metal materials

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Tin (Sn) target

Tin (Sn) target Purity≧4N

■ High purity Purity≧99.99% (4N)  High purity requirements for materials such as semiconductors and optical films ■ Good conductivity Tin (Sn) has excellent conductivity and is suitable for the production of transparent conductive films such as ITO thin films *For more details, please download the PDF or feel free to contact us.

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Niobium (Nb) target

Niobium (Nb) target Purity≧3N5

■ Four sides C processing ■ Controllable surface roughness ■ Internal Grain Size can be customized according to customer requirements ■ Configurable Import License ■ Experience in supplying semiconductor companies *For more details, please download the PDF or feel free to contact us.

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Tungsten (W) target

Tungsten (W) target Purity>5N

■High purity semiconductor W Target ■Powder metallurgy method for manufacturing ■Various Tungsten alloy target materials *For more details, please download the PDF or feel free to contact us.

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