PVA Japan Product Lineup

The "WSMS Integra HT" is a wafer surface measurement system designed to reliably and fully automatically detect ultra-trace levels of contamination inline. With a single fab-compatible platform, it detects and quantifies metal contamination on silicon wafer surfaces at ultra-trace levels. It is a fully automated, inline system that combines Vapour Phase Decomposition (VPD) and Inductively Coupled Plasma Mass Spectrometry (ICP-MS). 【Features】 ■ Fully automated VPD process ■ Modular and scalable platform ■ High throughput architecture ■ Audit-compliant verified results ■ Wide bandgap compatibility ■ Certified and fab-deployable *For more details, please download the PDF (English version) or feel free to contact us.

• Other measurement, recording and measuring instruments

The "SIRD SiC 200" is a system that recognizes and visualizes stress fields, defects, and buried structures within semiconductor wafers quickly, non-contact, and non-destructively. When there is stress within the material, it utilizes the photoelastic effect, where the polarization state of the probe laser changes. Various defects have unique stress fields, and this product optically visualizes them in a non-contact and non-destructive manner, detecting deviations early in the process chain. 【Features】 ■ Quantitative measurement of stress: Quantitative stress measurement at the wafer level ■ Wide doping range: Supports doping levels up to a resistivity of 5.1 mΩ·cm ■ Fully automated: Recipe-based measurement and analysis, compatible with SECS/GEM and OHT ■ Diverse semiconductor materials: Si, SiC, GaN, GaAs, InP, AlN, etc. *For more details, please download the PDF (English version) or feel free to contact us.

• Polarimetric analysis device

We provide plasma systems designed to be integrated into various transport architectures. These systems improve equipment operating rates through continuous substrate supply, enhance yield by reducing exposure to contamination, and achieve complete process traceability through integrated recipe management and SECS/GEM connectivity. Please feel free to consult us when you need assistance. 【Product Lineup】 ■GIGA690 AUTO ■80Plus AUTO ■AUTOfab GIGA690 ■AUTOfab 80Plus ■GIGAfab Modular *For more details, please download the PDF (English version) or feel free to contact us.

• Plasma surface treatment equipment

"Carbon.Pure" is a refining furnace for graphite, CFC (carbon fiber reinforced carbon), and carbon felt components. Using reactive or non-reactive gases, it removes impurities bonded as carbides to less than 3 ppm at temperatures up to 2,400°C under vacuum. With a vertical design and top or bottom loading, it is easy to handle, has a high operating rate, and achieves stable quality. It is designed and manufactured in Germany. 【Features】 ■ Ultra-high purity: Impurity level below 3 ppm ■ Excellent manufacturing quality: Long lifespan due to strict management ■ Maximum operating time ■ Global service team: Support and upgrades worldwide ■ Modular design and flexibility: Adjustable to fit your processes *For more details, please download the PDF (English version) or feel free to contact us.

• Industrial Furnace

"Kronos" is a high-performance VGF (Vertical Gradient Freeze) system designed for growing high-quality InP single crystals. In the VGF process, polycrystalline raw materials are solidified directionally from the bottom to the top. This is guided by a precisely controlled temperature gradient and a seed crystal that determines the orientation of the single crystal. Without moving the crucible, the heating output of four independent resistance heating zones is slowly reduced under computer control, moving the solidification interface upward. As a result, crystals with extremely low dislocation density, high homogeneity, reproducibility, and suitability for mass production are obtained. 【Features】 ■ Optimization of adiabatic design to minimize convection ■ Quick and easy loading/unloading with bayonet lock ■ Compatibility with two types of ingot sizes in one system (4-inch and 6-inch crystals) ■ High temperature stability (ΔT≦±0.5K) *For more details, please download the PDF (English version) or feel free to contact us.

• Other semiconductor manufacturing equipment