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santec Holdings

EstablishmentAugust 25, 1979
capital497856Ten thousand
number of employees184
addressAichi/Komaki-shi/Dacasuneyama Uesaka 5823
phone0568-79-3536
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last updated:Feb 19, 2026
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波長可変レーザ 波長可変レーザ
波長可変フィルタ 波長可変フィルタ
光学特性検査システム 光学特性検査システム
ビジネスソリューション ビジネスソリューション
光学特性検査システム

光学特性検査システム

当社製品を組合わせて光学特性を測定するコンプリートシステムの提供も行っております。 昨今、測定の高速化や高精度化が求められていますが、お客様のご要望に合わせシステム化を行いますのでお気軽にご相談ください。

Optical Characteristic Inspection System "Swept Test System"

High-speed, high-precision, and high-resolution evaluation of IL/WDL/PDL is possible!

The Swept Test System, which combines a wavelength-tunable light source (TSL series), a multi-port power meter (MPM series), a polarization control unit (PCU-110), and dedicated software, serves as an optimal evaluation tool for both research and development of optical devices and production environments. By referencing the output power from the wavelength-tunable light source in real-time and simultaneously acquiring the optical power transmitted through the DUT, high-precision measurements of IL/WDL/PDL can be achieved. This system calculates PDL using the Mueller matrix method. ■ Features - Rescaling algorithm (high resolution 0.1 pm) - Real-time power reference (reproducibility 0.02 dB) - High-precision wavelength monitor built into the light source (absolute wavelength accuracy 3 pm)

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Optical Coherence Tomography (High-Speed Type) 'IVS-2000-HS'

Even in a scattered medium, light can penetrate easily, making it suitable for measuring objects with strong scattering!

The "IVS-2000-HS" is an SS-OCT system capable of high-speed measurements in the center wavelength range of 1310nm. With high-speed (100kHz) measurements, it can reduce measurement time in inline inspections and other applications. It achieves a high axial resolution of less than 18um (in air), allowing for highly accurate tomographic measurements. 【Features】 ■ Center wavelength: 1310nm ■ A-line rate: 100kHz ■ High axial resolution: less than 18um (in air) *For more details, please download the PDF or feel free to contact us.

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Optical Coherence Tomography Device 'IVS-2000-LC'

It is possible to perform 3D measurements of objects with varying heights all at once!

The "IVS-2000-LC" is an SS-OCT system with a deep imaging range centered at a wavelength of 1310nm. This wavelength range allows light to penetrate easily even in scattering materials, making it suitable for measuring highly scattering objects. With a deep imaging range (over 18mm in air), it is possible to perform three-dimensional measurements of objects with varying heights all at once. 【Features】 ■ Center wavelength: 1310nm ■ A-line rate: 50kHz ■ High axial resolution: less than 18um (in air) *For more details, please download the PDF or feel free to contact us.

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Optical Coherence Tomography (High Resolution Type) 'IVS-2000-HR'

Even in a scattered medium, light can penetrate easily, making it suitable for measuring strongly scattering objects!

The "IVS-2000-HR" is an SS-OCT system with a high resolution centered at a wavelength of 1310nm. It has the highest resolution in the IVS series (less than 5um in vivo), enabling measurements with even higher resolution and clarity. The high axial resolution is less than 9um (in air), and the A-line rate is 20kHz. 【Features】 ■ Center wavelength: 1310nm ■ A-line rate: 20kHz ■ High axial resolution: less than 9um (in air) *For more details, please download the PDF or feel free to contact us.

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Wafer Thickness Distribution Measurement Device "TMS-2000"

Non-contact measurement of flatness with a repeatability of 1nm is possible!

The TMS-2000 is a super high-precision wafer thickness distribution measurement device with innovative hardware design and high resistance to environmental changes. It enables inline inspection of various wafer materials such as silicon (up to P+++), SiC, sapphire, glass, LiNb3, and SOI, allowing for a wide range of applications that take advantage of high throughput and compact size. It adopts a spiral scan method that balances high speed and high-density measurement. The compact design allows for space-saving placement. 【Features】 - Stable thickness measurement based on high resistance to environmental temperature changes and vibrations - Sub-nanometer repeat measurement accuracy - High flexibility in scanning methods to measure thickness distribution on the wafer surface - Measurement possible even when attached to jigs with light irradiation from one side - Differential analysis possible with multiple different wafers - Measurement of evaluation parameters compliant with SEMI standards *For more details, please download the PDF or feel free to contact us.

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Optical 3D Measuring Instrument "OPS-1000"

An ultra-sensitive model with over 100 times the minimum light reception sensitivity compared to conventional methods!

The "OPS-1000" is an optical three-dimensional measuring device that applies the technology of high-speed wavelength-variable lasers to interferometric measurement. With high-speed measurement of up to 100,000 points per second, it enables complete automated inspection in the manufacturing process. Coaxial measurement allows for easy measurement of complex shapes. It achieves a minimum light reception sensitivity of 100 dB and a dynamic range of 70 dB. It offers world-class performance among three-dimensional measuring devices. 【Features】 ■ Ultra-high sensitivity - Minimum light reception sensitivity of 100 dB and a dynamic range of 70 dB ■ High-speed measurement - Enables complete automated inspection in the manufacturing process with high-speed measurement of up to 100,000 points per second ■ Coaxial measurement - Allows for easy measurement of complex shapes through coaxial measurement *For more details, please download the PDF or feel free to contact us.

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Special feature on optimal solutions for the characteristic evaluation of optoelectronic fusion devices.

Evaluation solution to accelerate SiPh/PIC development.

This product line is a measurement solution that enables high-speed and high-precision characterization and defect analysis in the development of silicon photonics (SiPh) and photonic integrated circuits (PIC). In the development of optoelectronic fusion devices, it is crucial to determine "how quickly measurement results can be fed back into development." By accurately evaluating various optical characteristics and quickly identifying issues, it contributes to improving development efficiency. In addition to WDL and PDL characteristics, it is also possible to measure the reflection positions inside the device using OFDR technology, allowing for the identification of loss occurrence points.

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