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  3. 林純薬工業 電子材料部
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林純薬工業 電子材料部

capital10000Ten thousand
number of employees259
addressOsaka/Chuo-ku, Osaka-shi/3-2-12 Nairincho
phone06-6910-7336
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last updated:Jan 17, 2024
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林純薬工業 List of Products and Services

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Etching solutions for various metals Etching solutions for various metals
Developer / Stripping solution Developer / Stripping solution
Texture etching solution Texture etching solution
Roughening etching solution Roughening etching solution
Contract processing Contract processing
Low metal (UHP) grade chemicals Low metal (UHP) grade chemicals
class="retina-image"

Responding with flexibility and quick action! "Contract Manufacturing of Chemical Products"

We support the manufacturing of high-quality chemical products with flexible and speedy responses. Utilizing our extensive experience and advanced equipment, we propose the optimal manufacturing and supply methods!

Rin Jun Pharmaceutical Industry is a manufacturing partner of chemical products that meets the diverse needs of customers, particularly in the electronic device sector. In response to challenges such as production volume, quality, and cost, each department works together to provide flexible and prompt solutions, proposing optimal manufacturing and supply methods. With reliable quality and stable supply, we strongly support our customers' businesses. *For more details, please download the PDF or contact us directly.*

  • Contract manufacturing
  • Processing Contract

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InP roughening etching solution

The surface of the InP film can be effectively roughened through etching, which can improve the light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at low temperatures and in a short time. - The in-plane uniformity of the uneven surface shape is excellent. Keywords: frost treatment, unevenness, LED, light-emitting diode, indium phosphide.

  • Chemicals

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Contracted Services <Image Observation/Chemical Treatment> *Such as semiconductor substrates and LCD substrates

High-resolution SEM images available! Contract services for image observation of semiconductor substrates, LCD substrates, electronic device substrates, and more.

Rin Junyaku Kogyo Co., Ltd. has been developing and evaluating functional chemicals such as etching solutions and stripping solutions as a manufacturer of chemical solutions for electronic materials. Based on the know-how gained from development and evaluation, we can perform image observation tailored to your needs. For image observation, we can provide high-resolution SEM images using ultra-high-resolution FE-SEM (in-lens). Additionally, we can accommodate detailed image observation through processing at specific locations using FIB equipment. We also flexibly support chemical processing (Dip, Spray). We conduct image observation and chemical processing for semiconductor substrates, LCD substrates, electronic device substrates, and contribute to improving evaluation efficiency. 【Recommended for those who:】 ■ Need high-resolution SEM images ■ Do not own observation equipment ■ Have a large volume of image observation tasks ■ Want to improve evaluation efficiency ■ Do not own chemical processing equipment *For more details, please refer to the PDF materials or feel free to contact us.

  • Other contract services

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Reagent preparation service <Case study presentation>

From small quantities to large volumes. Providing suitable products with our unique blending technology. Eliminating the burden of reagent preparation and contributing to business improvement.

Our company provides reagent preparation services suitable for various applications through "unique blending technology," "high-quality product inspection systems," "flexible related technologies," and "a diverse range of related products." Based on the experience and technical expertise we have cultivated as a comprehensive reagent manufacturer over many years, we can offer reagents tailored to usage amounts and conditions, ranging from small quantities (100 mL) to large volumes (1 cubic meter container). **Benefits of Outsourcing Reagent Preparation** - Reduction of expired chemicals due to time-related changes - Avoidance of excessive reagent purchases - Elimination of the hassle of cleaning equipment and the need for personnel for such tasks - Contribution to environmental conservation through waste reduction - Reduced risks related to safety and disaster prevention ★ You can view materials summarizing case studies from the "PDF Download." Please feel free to contact us for inquiries about our services.

  • Other contract services

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Contract manufacturing services for chemical materials used in electronics.

Leveraging abundant experience and technical expertise to provide high-quality chemical products. Equipped with a variety of analytical instruments, we also ensure thorough quality control.

Our company offers a "contract manufacturing service" for various chemical products used in the manufacturing of LCD panels, semiconductors, and electronic components. We have a wide range of analytical instruments and ensure thorough quality control through appropriate analytical equipment and advanced analytical techniques. Based on our extensive experience and technical expertise as a specialized chemical manufacturer, we can propose manufacturing and supply methods tailored to your needs regarding production volume, quality, and cost. 【Our Strengths】 ■ Established in 1904, a specialized chemical manufacturer with abundant experience ■ A comprehensive range of 12 types of analytical instruments ■ A stable supply network established nationwide ■ Various container sizes available to meet your needs ■ Chemicals we can handle: various chemical products used in the manufacturing of LCD panels, semiconductors, and electronic components, such as stripping solutions, etching solutions, and cleaning solutions. *For more details, please feel free to contact us.

  • Processing Contract

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[Project Story] Introduction of Case Studies

 

The challenges and requests surrounding our customers' businesses are diverse. Hayashi Junyaku Kogyo is solving these challenges through various approaches. You can refer to the projects we have tackled with our creativity through the link below.

  • Chemicals

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Low metal (UHP) grade chemical PGMEA

We have commercialized a low metal grade (UHP grade) of PGMEA. We propose it as a grade that can be used in fields where ultra-low metal content is required.

- Low metal content through purification Guaranteeing 33 elements at below 50 ppt - Metal assurance through high-precision analysis Introduction of ICP-MS/MS, improvement of analytical techniques - Thorough quality control Clean management from manufacturing environment to supply containers - Compatible with various containers 500ml, 20L, 200L, 18L canisters, and more As the second phase, we are developing PGME, ethyl lactate, and others. Keywords: ultra-high purity, low metal, ultra-trace analysis

  • Chemicals

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[Comprehensive Catalog] High-performance pharmaceuticals packed with 110 years of history and technology.

A comprehensive catalog of high-performance chemicals essential for the manufacturing of electrical and electronic devices, filled with 110 years of experience, technology, and know-how.

Lin Jun Pharmaceutical Industry boasts a history of 110 years since its founding and is a manufacturer of functional industrial chemicals that provide high-performance pharmaceuticals. We are pleased to announce the publication of a comprehensive catalog of functional pharmaceuticals that condenses our experience and technology. This catalog includes various high-performance chemical solutions essential for the manufacturing processes of electrical and electronic devices, such as metal film etching solutions, developing solutions, stripping solutions, texture etching solutions, and roughening etching solutions. We will be giving away this comprehensive catalog of high-performance pharmaceuticals for free to 20 companies through a lottery! 【How to Apply】 If you are interested, please apply through the "Contact Us" section below. *You can view an excerpt version from the "Download" section.

  • Contract manufacturing
  • Surface treatment contract service
  • Other electronic parts

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Standard sample for Al・Mo・Mo/Al/Mo multilayer film

It etches single films of Al, Al alloys, or Mo, Mo alloys, as well as layered films such as Mo/Al/Mo and Mo alloy/Al alloy/Mo alloy effectively.

The features of this product are as follows: - It forms a good positive taper. - It has minimal side etching, allowing for the formation of fine patterns. - The etching speed and in-plane uniformity of the etching shape are excellent. Keywords: wet etching, aluminum, molybdenum, AlCu, MAM, multilayer film

  • Chemicals

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Al taper control etching solution

Etch the Al or Al alloy film at the desired taper angle.

The features of this product are as follows: - It forms the desired taper shape (taper angle). - It etches Al and Al alloy films effectively. - The etching speed and the in-plane uniformity of the etching shape are good. Keywords: wet etching, aluminum

  • Chemicals

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Ag・Ag alloy・Ag-based laminated film etching solution

This etching solution is ideal for etching single-layer films of silver alloys such as Ag single films, APC (Ag-Pd-Cu alloy) films, or laminated films of Ag/transparent conductive films.

The features of this product are as follows: - The etching rate is stable. - There is minimal side etching, allowing for the formation of fine patterns. - The in-plane uniformity of etching speed and etching shape is excellent. Keywords: wet etching, silver, APC

  • Chemicals

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Cu etching solution "Pure Etch C series"

We etch Cu and Cu alloy films effectively. We offer solutions for standard thin film etching and bulk etching of Cu/Ti stacked films.

The features of this product are as follows: - It forms a good positive taper. - There is minimal side etching, allowing for the formation of fine patterns. - The etching speed and in-plane uniformity of the etching shape are excellent. Keywords: wet etching, copper

  • Chemicals

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Cu seed layer etching solution

For the Cu plating/Cu seed structure, it etches the Cu seed layer with minimal damage to the Cu plating wiring and bumps.

The features of this product are as follows: - There is less thinning of the Cu plating. - There is less surface roughness of the Cu. - It can be applied to various seed layers (from electroless copper plating to sputtered copper). - It supports various methods such as dip, spray, and spin. Keywords: wet etching, copper, plating, seed layer, selective semi-additive method.

  • Chemicals

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Ti etching solution standard, Ti seed layer etching solution

We will etch the Ti film effectively. We have options for standard thin film etching and Ti seed layer etching.

The features of this product are as follows: - It has minimal side etching, allowing for the formation of fine patterns. - The etching speed and in-plane uniformity of the etching shape are excellent. - It is suitable for laminated films such as Cu/Ti and W/Ti. Keywords: wet etching, titanium

  • Chemicals

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W Etching Solution 'Pure Etch W Series'

We will etch the W film well.

The features of this product are as follows: - It forms a good positive taper. - There is minimal side etching, allowing for the formation of fine patterns. - The etching speed and in-plane uniformity of the etching shape are good. - There are no residues after etching. Keywords: Wet etching, tungsten

  • Chemicals

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TiW Etching Solution "Pure Etch TE Series"

We etch TiW films effectively. Since the etching performance varies depending on the film formation method and film structure, please contact us for more details.

The features of this product are as follows: - It forms a good positive taper. - There is minimal side etching, allowing for the formation of fine patterns. - The etching speed and in-plane uniformity of the etching shape are excellent. - There is no residue after etching. Keywords: wet etching, titanium tungsten

  • Chemicals

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Au Etching Solution "Pure Etch AU series"

We will etch the Au film well. There are also etching solutions for seed layers that cause little damage to the Au plating and allow for etching of the Au seed layer.

The features of this product are as follows: - It allows for processing at low temperatures and in a short time. - The etching speed and in-plane uniformity of the etching shape are excellent. - It is suitable for fine bump formation and pattern formation processes. Keywords: wet etching, gold, plating, seed layer, selective etching solution.

  • Chemicals

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Cr Etching Solution "Pure Etch CR series"

We will etch the Cr film well. If you are considering the formation of fine patterns, we also offer suggestions for pretreatment solutions to improve wettability.

The features of this product are as follows: - It has minimal side etching, allowing for the formation of fine patterns. - The etching speed and in-plane uniformity of the etching shape are excellent. - It is suitable for etching of black matrix (BM) and photo masks made of chromium. Keywords: wet etching, chromium

  • Chemicals

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Ni Etching Solution "Pure Etch NE series"

It etches the Ni film well.

The features of this product are as follows: - There is little side etching, allowing for the formation of fine patterns. - The etching speed and the in-plane uniformity of the etching shape are excellent. Keywords: Wet etching, nickel For roughening etching solution that processes the surface shape of Ni into a rough texture, please refer to the "Ni Roughening Etching Solution" page.

  • Chemicals

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ITO etching solution "Clean Etch ITO series"

We provide excellent etching for ITO films, with options available for both a-ITO etching and p-ITO etching.

The features of this product are as follows: - There are no residues after etching. - It has low foaming properties and excellent defoaming capabilities. - The etching speed and the in-plane uniformity of the etching shape are good. Keywords: wet etching, indium tin oxide

  • Chemicals

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Ag nanowire etching solution

We provide excellent etching of Ag nanowire films, available for both full etching and partial etching.

The features of this product are as follows: - It allows for processing at low temperatures and in a short time. - By adjusting the composition and processing conditions, full etching is also possible. Keywords: wet etching, silver nanowires, AgNW, SNW

  • Chemicals

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PZT etching solution "Pure Etch PT series"

We will etch the PZT (lead zirconate titanate) film well.

The features of this product are as follows: - It etches without residue with a small amount of side etching. - It is compatible with PZT films produced by various film formation methods (sol-gel method, sputtering method, and other deposition methods). - Etching is possible using various processing methods such as dip and spray. - It also supports etching of bulk materials. - Non-toxic and non-hazardous products are also available. Keywords: wet etching, lead zirconate titanate

  • Chemicals

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Crystal etching liquid "Pure Etch ZE series"

We etch the quartz with a flatter bottom shape than conventional products without corroding the mask made of resist or metal films (such as Au and Cr).

The features of this product are as follows: - The angle difference of the taper angle in the cross-sectional shape can be reduced compared to conventional products. - The etched bottom surface can be etched more flatly than conventional products. - The uniformity of thickness is excellent. Keywords: wet etching, quartz

  • Chemicals
  • Chemicals

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Al Damage-Free Insulating Film Etching Solution

Al and Al alloy films are etched well without corroding the insulating film. We have products for etching processing and for removing Si natural oxide films.

The features of this product are as follows: - It does not corrode Al or Al alloys. - It forms a good tapered profile. - It can be used for the formation of vias and pads through wet etching. - It can also be used as a pretreatment solution for Pure Etch 160 (Al damage-free Si etching solution). Keywords: wet etching, SiO2, SiN, TEOS, silicon oxide film, silicon nitride film.

  • Other semiconductor manufacturing equipment

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Al Damage-Free Si Etching Solution (Anisotropic)

Al and Al alloy films are anisotropically etched well without corrosion.

The features of this product are as follows: - It enables the formation of a smooth etching surface. - Etching can be performed regardless of the metal opening ratio on the device surface. - There is minimal degradation of the etching solution. - It is recommended to use Pure Etch ZE series (Al damage-free insulating film etching solution) as a pretreatment solution. Keywords: wet etching, silicon anisotropic etching

  • Chemicals

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Si etching solution (isotropic)

We perform good isotropic etching of the Si film. In addition to standard isotropic etching solutions, we also have thinning etching solutions that are optimal for thinning Si substrates.

The features of this product are as follows: - Processing at low temperatures and in a short time is possible. - The surface after etching is mirror-like. Keywords: wet etching, silicon isotropic etching, silicon substrate thinning

  • Chemicals

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Resist stripping solution (amine/solvent-based, solvent-based, organic alkaline-based)

We have a range of stripping solutions, including those mixed with amines and solvents, solvent-based stripping solutions, and organic alkaline stripping solutions.

The features of this product are as follows: - It effectively removes resist without corroding metal or insulating films. - It can be processed at both low and high temperatures. - All resist stripping solutions are free of NMP. Keywords: resist, non-aqueous

  • Chemicals

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Release agent remover (water-based) "PureClean MC series"

The release of the resist is good. The water-based release agent does not fall under hazardous materials according to fire safety regulations.

The features of this product are as follows: - It effectively removes resist without corroding metal or insulating films. - It allows for processing at low temperatures and for short durations. - It does not use NMP. Keywords: resist, non-hazardous material

  • Chemicals

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Color filter rework stripping solution, polyimide stripping solution

It is a chemical agent optimal for rework delamination after BM, RGB, OC formation, or polyimide delamination.

The features of this product are as follows: - No intermediate rinse is required. - Low foaming, allowing for the combination of spray treatment and brush cleaning. - No flash point, and it is not subject to fire service laws. - It is recommended to use the Clean Etch ITO series as the etching solution for ITO films during color filter rework. Keywords: rework, color filter, color resist, polyimide.

  • Chemicals

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Single crystal silicon texture etching solution

We will form a texture on the single crystal silicon substrate (possible size: 2 to 3 μm).

The features of this product are as follows: - It is a one-component type that is used by adding to an alkaline solution. - It can form a TEX size of 2-3μm. - It requires a small amount of chemical solution and has a long chemical life. - It enables improvement in conversion efficiency due to the reduction of surface reflectivity after treatment. Keywords: texture formation, unevenness, single crystal Si, solar cells.

  • Chemicals

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AlGaInP roughening etching solution

The surface of the AlGaInP film can be effectively roughened through etching, which improves the light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at low temperatures and in a short time. - The in-plane uniformity of the uneven shape is good. Keywords: frost treatment, unevenness, LED, light-emitting diode, aluminum indium gallium phosphide.

  • Other semiconductor manufacturing equipment

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GaP roughening etching solution

The surface of the GaP film and the surfaces, slopes, and sides of the GaP substrate can be effectively roughened through etching, improving the light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at low temperatures and in a short time. - The in-plane uniformity of the uneven surface shape is good. Keywords: frost treatment, unevenness, LED, light-emitting diode, gallium phosphide, gallium nitride.

  • Chemicals

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AlGaAs/GaAs roughening etching solution

The surfaces of AlGaAs films, GaAs films, and GaAs substrates can be effectively roughened through etching, improving light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at low temperatures and in a short time. - The in-plane uniformity of the uneven surface shape is good. Keywords: frost treatment, unevenness, LED, light-emitting diode, aluminum gallium arsenide, gallium arsenide.

  • Chemicals

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GaN (N-face) rough surface etching solution

The surface of the GaN (N-face) film can be effectively roughened through etching, improving the light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at room temperature to high temperatures. - The in-plane uniformity of the uneven surface shape is good. Keywords: frost treatment, unevenness, LED, light-emitting diode, gallium nitride.

  • Chemicals

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Ni rough surface etching solution "Pure Etch MF series"

The surface of Ni is well roughened and etched without using any special techniques.

The features of this product are as follows: - It forms the desired unevenness. - The uniformity of the uneven surface shape is good. Keywords: chemical roughening, unevenness, nickel, plating, sputtering.

  • Chemicals

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SUS Roughening Etching Solution "PureEtch MF series"

The surface of SUS material is effectively roughened by etching without using any special techniques.

The features of this product are as follows: - It forms desired unevenness on the surface of various SUS materials. - The in-plane uniformity of the uneven surface shape is excellent. Keywords: chemical roughening, unevenness, stainless steel

  • Chemicals

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Roughening etching solution

Reduction of reflectivity, improvement of efficiency, enhancement of adhesion, roughening of silicon, compound semiconductors, and metal surfaces.

- It forms the desired unevenness. - The in-plane uniformity of the uneven shape is good.

  • Chemicals

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    大型品の切削や低コストな複合加工に。ロボットシステムの資料進呈

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