TECHNOVISION, INC. List of Products and Services

"Advanced cleaning know-how condensed to support high-level purification!" In the context of diversifying semiconductor devices, design rules entering the nano realm, and the increasing demand for yield improvement in an ever-evolving environment, contamination control is positioned as one of the most critical solutions to address these challenges. The cassette cleaning device "Model TCC-803" provided by TechVision condenses this advanced cleaning know-how that supports such high-level purification.

Scrubbing, rinsing, and drying performed by a single machine Techno Vision's photomask cleaning device is a mask cleaner that performs scrubbing, rinsing, and drying in one unit to clean dust and dirt attached to photomasks. To meet the diverse needs of our customers, we offer a range of cleaning devices, including TWE-200, TW-300, TW-700, and TW-1000, that accommodate photomasks from small to large sizes.

A simple mask cleaning device that removes particles larger than 1μm attached to masks. It is a two-tank mask cleaning device, where scrubbing cleaning with a dedicated brush and rinsing are performed in the first tank, and hot pure water drying is carried out in the second tank. In the scrubbing cleaning of the first layer, cleaning with a dedicated chemical solution is also offered as an option. Using the dedicated chemical solution makes it possible to remove resist residues.

The Techno Vision photo mask cleaning device is a mask cleaner that performs scrubbing, rinsing, and drying all in one machine to clean dust and dirt attached to photo masks. To meet the diverse needs of our customers, we offer cleaning devices that accommodate a wide range of photo mask sizes, from small to large, including the TW-200, TW-300, TW-700, and TW-1000.

The TWC-200A has been specifically developed for the cleaning of masks used in the exposure process. The main feature of this device is its ability to simultaneously and fully automatically remove both resist and particles adhered to the mask. In particular, for resist removal, a dedicated cleaning agent was developed in collaboration with a major chemical manufacturer, significantly improving the removal effectiveness while also considering safety and the global environment. The operator simply needs to place a cassette loaded with the mask. This enhances safety by eliminating exposure to hazardous chemicals and greatly contributes to improving the quality of the exposure process and yield.

You can choose the necessary unit for mask cleaning based on your usage environment. ■Main Features - Can be used for mask cleaning up to 7 inches - Ideal for research and development purposes or small-scale mask cleaning - Select the necessary unit to be used in conjunction with existing equipment - Recommended even if the budget for capital investment is tight *For details such as custom support, please feel free to contact us.

The ultraviolet ozone cleaning device emits ultraviolet light of a specific wavelength to generate ozone (O3), which is then used to oxidize and decompose organic compounds, thereby removing organic contamination from the work surface and modifying the surface. The UV ozone cleaning devices UV-208 and UV-312 provided by Technovision utilize high-density grid-shaped low-pressure mercury lamps as the UV light source, allowing for uniform irradiation of the entire work area without the need for complex mechanisms, making it a simple dry cleaning device. It demonstrates its effectiveness as a final cleaning step.