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  1. Home
  2. Electronic Components and Semiconductors
  3. プラズマ・サーモ・ジャパン
  4. "MEMS Engineer Forum 2025" - Announcement of Technical Exhibitions
SEMINAR_EVENT
  • Mar 18, 2025
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Mar 18, 2025

"MEMS Engineer Forum 2025" - Announcement of Technical Exhibitions

プラズマ・サーモ・ジャパン プラズマ・サーモ・ジャパン
We will be exhibiting at the technical exhibition corner of the "MEMS Engineer Forum 2025" to be held from April 16 to 17, 2025. <Exhibition Contents> 1. Introduction of low-temperature, low-damage etching and cleaning equipment using high-density radicals. Our patented HDRF technology eliminates yield issues in MEMS. 2. Introduction of processing technology (ion beam etching) essential for future high-frequency devices and high-speed optical modulation waveguide processing. Ion beam etching is optimal for processing multilayer structures, allowing for angle adjustment of the processing surface and roughness adjustment of sidewalls. 3. Introduction of plasma etching and film deposition equipment suitable for batch processing of compound semiconductors. Multiple wafers can be loaded onto a "shuttle" (wafer carrier) for batch processing. This equipment is suitable for small-scale production. We look forward to your visit.
Date and time Wednesday, Apr 16, 2025 ~ Thursday, Apr 17, 2025
10:00 AM ~ 04:00 PM
Capital Tokyo, Ryogoku International Fashion Center Building (KFC Hall)
Entry fee Free
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MEMS Engineer Forum - Notice of Technical Exhibition

Improving the precision and efficiency of MEMS processing! We will introduce high-precision etching and film deposition technologies. *Held from April 16 to April 17.

Plasma Thermo Japan Co., Ltd. will exhibit at the technical exhibition corner of the "MEMS Engineer Forum 2025" held at the International Fashion Center Building (KFC Hall) in Ryogoku, Tokyo. <Exhibition Contents> 1. Low-temperature, low-damage etching and cleaning equipment using high-density radicals The patented HDRF technology (High Density Radical Flux) eliminates the causes of yield reduction in MEMS. 2. Processing technology essential for future high-frequency devices and high-speed optical modulation waveguide processing (Ion Beam Etching) Ion beam etching suitable for processing multilayer structures. The tilt mechanism of the wafer stage allows for adjustment of side wall angles. 3. Plasma etching and film deposition equipment suitable for batch processing of compound semiconductors Multiple wafers can be loaded onto a "shuttle" (wafer carrier) for batch processing. This equipment is suitable for small-scale production. We sincerely look forward to your visit. *You can download the equipment catalog. *Please feel free to contact us for more details.

  • Etching Equipment

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高密度ラジカルクリーニングソリューション『KAYEN、ODYSSEY』1.JPG

High-Density Radical Cleaning Solution

Generates 50 to 100 times more radicals compared to similar technologies from other companies, providing a damage-free process!

The high-density radical cleaning process can completely remove residues such as photoresist and polymers without damaging delicate devices or complex structures. Furthermore, for fine structures such as medical implants, our unique plasma source using remote plasma allows for the removal of residues that could not be completely eliminated by wet processes. Additionally, processing can be performed at both high and low temperatures for complex shapes using high-density radical flux. 【Features】 ■ Flexible processing over a wide temperature range ■ High selectivity and uniformity in the process ■ Capability to completely clean samples with complex shapes *For more details, please feel free to contact us.

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強誘電体イオンビームエッチングソリューション『QuaZar』1.JPG

Ferroelectric Ion Beam Etching Solution 'QuaZar'

Inert gas Ar etching and enhanced RIBE using reactive gases are possible!

"QuaZar" is an etching processing technology that enables vertical etching capability, which is difficult to achieve with plasma etching, in the etching process of hard-to-etch materials such as ferroelectric PZT, thanks to its large-area ion source and advanced motion control. By adopting a unique Ion Source, Marathon Grids, and optional Dual PBN, it triples the MTBM compared to conventional products (and can also be installed in existing equipment from other companies). Additionally, the REDEP Breaker and AUXILIARY Electrode prevent RF shunting and anode disappearance. 【Features】 ■ In PZT etching applications, etch stop is possible with noble metal electrode layers without EPD (with no deposition on sidewalls and a smooth surface). ■ The selectivity of photoresist in PZT etching improves from 0.6:1 with inert IBE to 1.1:1 with RIBE. ■ The etching speed for PZT improves from about 20 nm/min with inert IBE to about 30 nm/min with RIBE. *For more details, please feel free to contact us.

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Related catalog(3)

Plasma Removal Device "HDRF"

Plasma Removal Device "HDRF"

PRODUCT
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Contact this catalog

Ion Beam Etching and Deposition Equipment 'QuaZar(TM)'

Ion Beam Etching and Deposition Equipment 'QuaZar(TM)'

PRODUCT
  • E-book viewing
  • Catalog download

Contact this catalog

Corial 200 Series Film Formation Device

Corial 200 Series Film Formation Device

PRODUCT
  • E-book viewing
  • Catalog download

Contact this catalog

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Electronic Components and Semiconductors
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Notice of Participation in the 2026 Yokohama Automotive Technology Exhibition

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Sekisui Filler Co., Ltd. will exhibit at the "Automotive Technology Exhibition 2026 YOKOHAMA" held at PACIFICO YOKOHAMA from May 27. (Booth number 285, within the Sekisui Chemical booth) 【Exhibited Products】 Mobility G - Re-sealable gasket HM (EV Seal 500) - Interior materials (Thermonex/Swiftlock) - Battery protection materials (EV Protect 4006SFR, etc.) Electronics / Automotive Electronics - Adhesives for camera modules - Adhesives for displays - Conformal coatings - Optical adhesives We sincerely look forward to your visit.

May 15, 2026

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Exhibition Information : 28th INTERPHEX Week Tokyo

  • NEW
  • SEMINAR_EVENT

Dear Sir or Madam, We hope this message finds you well and that your company continues to prosper. FUKUDA will be exhibiting at the 28th INTERPHEX Week Tokyo. At the exhibition, we will be showcasing 100% inspection equipment compliant with Container Closure Integrity Testing (CCIT) standards, as well as sampling inspection machines. We sincerely invite you to visit our booth at this opportunity and would greatly appreciate your attendance despite your busy schedule. Yours sincerely, [Dates] May 20 (Wed) - 22 (Fri), 2026 10:00-17:00 (JST) [Venue] Makuhari Messe, Japan 8 Hall Booth No. 41 - 36

May 14, 2026

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Exhibition Information : AUTOMOTIVE ENGINEERING EXPOSITION 2026 YOKOHAMA

  • NEW
  • SEMINAR_EVENT

Dear Sir or Madam, We hope this message finds you well and that your company continues to prosper. FUKUDA will be exhibiting at the AUTOMOTIVE ENGINEERING EXPOSITION 2026 YOKOHAMA. At this exhibition, we will be showcasing testing equipment such as Air Leak Tester for EV and Equipment Mounted Type Hydrogen Leak Detector. We sincerely hope you will take this opportunity to visit us. Yours sincerely, [Official Site] https://aee.expo-info.jsae.or.jp/en/yokohama/ [DATES] Wednesday, May 27, through Friday, May 29, 2026 10:00 a.m. - 5:00 p.m. [VENUE] PACIFICO Yokohama, Exhibition Hall, Booth No. 274 ※Online Exposition Website:Tuesday, May 19, through Tuesday, June 9, 2026

May 14, 2026

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We will exhibit at the "JECA FAIR 2026" (Tokyo Big Sight).

  • NEW
  • SEMINAR_EVENT

Our company will be exhibiting at the "JECA FAIR 2026 - 74th Electrical Construction Industry Exhibition" held at Tokyo Big Sight from May 27 (Wednesday) to May 29 (Friday), 2026. At this exhibition, we will introduce products such as the coreless current sensor (for reference), the "PAL-Plus typeE / PAL-Plus typeE2" suitable for simple electric power measurement in factories and facilities, and the management software "CEW-M4" that visualizes and manages power consumption and surplus capacity of equipment. 【Main Exhibited Products】 - Wire-wound coreless current sensor (for reference) - PAL-Plus typeE / PAL-Plus typeE2 - CEW-M4 Please take a look at our solutions that are easy to implement even in confined spaces or where power outage work is to be avoided, and that help solve on-site challenges. We sincerely look forward to your visit.

May 13, 2026

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Notice of Participation in Robot Technology Japan 2026 (June 11-13, 2026)

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  • SEMINAR_EVENT

Troax Safety Systems Co., Ltd. will be exhibiting at "Robot Technology Japan." We plan to showcase various solutions that contribute to safety measures and productivity improvement in robot implementation sites. Please be sure to visit our booth. Venue: Aichi Sky Expo, D64 (Aichi Prefectural International Exhibition Center)

May 13, 2026

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