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  1. Home
  2. Electronic Components and Semiconductors
  3. プラズマ・サーモ・ジャパン
  4. "MEMS Engineer Forum 2025" - Announcement of Technical Exhibitions
SEMINAR_EVENT
  • Mar 18, 2025
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Mar 18, 2025

"MEMS Engineer Forum 2025" - Announcement of Technical Exhibitions

プラズマ・サーモ・ジャパン プラズマ・サーモ・ジャパン
We will be exhibiting at the technical exhibition corner of the "MEMS Engineer Forum 2025" to be held from April 16 to 17, 2025. <Exhibition Contents> 1. Introduction of low-temperature, low-damage etching and cleaning equipment using high-density radicals. Our patented HDRF technology eliminates yield issues in MEMS. 2. Introduction of processing technology (ion beam etching) essential for future high-frequency devices and high-speed optical modulation waveguide processing. Ion beam etching is optimal for processing multilayer structures, allowing for angle adjustment of the processing surface and roughness adjustment of sidewalls. 3. Introduction of plasma etching and film deposition equipment suitable for batch processing of compound semiconductors. Multiple wafers can be loaded onto a "shuttle" (wafer carrier) for batch processing. This equipment is suitable for small-scale production. We look forward to your visit.
Date and time Wednesday, Apr 16, 2025 ~ Thursday, Apr 17, 2025
10:00 AM ~ 04:00 PM
Capital Tokyo, Ryogoku International Fashion Center Building (KFC Hall)
Entry fee Free
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MEMS Engineer Forum - Notice of Technical Exhibition

Improving the precision and efficiency of MEMS processing! We will introduce high-precision etching and film deposition technologies. *Held from April 16 to April 17.

Plasma Thermo Japan Co., Ltd. will exhibit at the technical exhibition corner of the "MEMS Engineer Forum 2025" held at the International Fashion Center Building (KFC Hall) in Ryogoku, Tokyo. <Exhibition Contents> 1. Low-temperature, low-damage etching and cleaning equipment using high-density radicals The patented HDRF technology (High Density Radical Flux) eliminates the causes of yield reduction in MEMS. 2. Processing technology essential for future high-frequency devices and high-speed optical modulation waveguide processing (Ion Beam Etching) Ion beam etching suitable for processing multilayer structures. The tilt mechanism of the wafer stage allows for adjustment of side wall angles. 3. Plasma etching and film deposition equipment suitable for batch processing of compound semiconductors Multiple wafers can be loaded onto a "shuttle" (wafer carrier) for batch processing. This equipment is suitable for small-scale production. We sincerely look forward to your visit. *You can download the equipment catalog. *Please feel free to contact us for more details.

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高密度ラジカルクリーニングソリューション『KAYEN、ODYSSEY』1.JPG

High-Density Radical Cleaning Solution

Generates 50 to 100 times more radicals compared to similar technologies from other companies, providing a damage-free process!

The high-density radical cleaning process can completely remove residues such as photoresist and polymers without damaging delicate devices or complex structures. Furthermore, for fine structures such as medical implants, our unique plasma source using remote plasma allows for the removal of residues that could not be completely eliminated by wet processes. Additionally, processing can be performed at both high and low temperatures for complex shapes using high-density radical flux. 【Features】 ■ Flexible processing over a wide temperature range ■ High selectivity and uniformity in the process ■ Capability to completely clean samples with complex shapes *For more details, please feel free to contact us.

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強誘電体イオンビームエッチングソリューション『QuaZar』1.JPG

Ferroelectric Ion Beam Etching Solution 'QuaZar'

Inert gas Ar etching and enhanced RIBE using reactive gases are possible!

"QuaZar" is an etching processing technology that enables vertical etching capability, which is difficult to achieve with plasma etching, in the etching process of hard-to-etch materials such as ferroelectric PZT, thanks to its large-area ion source and advanced motion control. By adopting a unique Ion Source, Marathon Grids, and optional Dual PBN, it triples the MTBM compared to conventional products (and can also be installed in existing equipment from other companies). Additionally, the REDEP Breaker and AUXILIARY Electrode prevent RF shunting and anode disappearance. 【Features】 ■ In PZT etching applications, etch stop is possible with noble metal electrode layers without EPD (with no deposition on sidewalls and a smooth surface). ■ The selectivity of photoresist in PZT etching improves from 0.6:1 with inert IBE to 1.1:1 with RIBE. ■ The etching speed for PZT improves from about 20 nm/min with inert IBE to about 30 nm/min with RIBE. *For more details, please feel free to contact us.

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Related catalog(3)

Plasma Removal Device "HDRF"

Plasma Removal Device "HDRF"

PRODUCT
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Ion Beam Etching and Deposition Equipment 'QuaZar(TM)'

Ion Beam Etching and Deposition Equipment 'QuaZar(TM)'

PRODUCT
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  • Catalog download

Contact this catalog

Corial 200 Series Film Formation Device

Corial 200 Series Film Formation Device

PRODUCT
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Electronic Components and Semiconductors
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[Notice of Exhibition Participation by Fukuda Co., Ltd.] 27th Interphex Week Tokyo

  • NEW
  • SEMINAR_EVENT

We would like to extend our heartfelt congratulations on the continued prosperity of your esteemed company. Our company will be exhibiting at the following trade show, where we will showcase a variety of products, including new ones. We sincerely apologize for the inconvenience during your busy schedule, but we would like to invite you to attend this event. 【 Exhibition Name 】 27th INTERPHEX Week Tokyo https://www.interphex.jp/tokyo/ja-jp.html 【 Dates 】 July 9 (Wednesday) - 11 (Friday), 2025 10:00 AM - 5:00 PM 【 Venue 】 Tokyo Big Sight (3-11-1 Ariake, Koto-ku, Tokyo 135-0063)

Mar 27, 2026

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[Notice of Exhibition Participation by Fukuda Co., Ltd.] 2025 YOKOHAMA Automotive Technology Exhibition

[Notice of Exhibition Participation by Fukuda Co., Ltd.] 2025 YOKOHAMA Automotive Technology Exhibition

  • NEW
  • SEMINAR_EVENT

We would like to extend our heartfelt congratulations on the continued prosperity of your esteemed company. Our company will be exhibiting at the following trade show, where we will showcase a variety of products, including new ones. We sincerely invite you to visit us during this busy time. 【 Exhibition Name 】 Automotive Technology Exhibition 2025 YOKOHAMA https://aee.expo-info.jsae.or.jp/ja/yokohama/ (An "online exhibition" will also be held during and around the event period) 【 Dates 】 May 21 (Wednesday) - 23 (Friday), 2024 10:00 AM - 6:00 PM *On the final day, 9:00 AM - 4:00 PM (Online exhibition: May 14 (Wednesday) - June 4 (Wednesday)) 【 Venue 】 Pacifico Yokohama (1-1-1 Minatomirai, Nishi-ku, Yokohama, Kanagawa Prefecture) Our booth number: "Concourse 505"

Mar 27, 2026

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Notice of participation in FOOMA JAPAN 2026 (International Food Industry Exhibition) from June 2 (Tuesday) to June 5 (Friday), 2026.

  • NEW
  • SEMINAR_EVENT

Nakakin will be exhibiting at 'FOOMA JAPAN 2026 (International Food Industry Exhibition)' held at Tokyo Big Sight. This exhibition proposes "A rich future opened by food technology" through cutting-edge technology, products, and services in food machinery, amidst growing interest in "food safety and security." We aim to facilitate the exchange and dissemination of technology and information related to food machinery, equipment, and associated devices, contributing to the further development of the food industry. We sincerely look forward to your visit.

Mar 27, 2026

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[Seminar] International Trends in Decarbonization and Renewable Energy After the Iran War

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  • SEMINAR_EVENT

[Speaker] Academic Visitor, University of Strathclyde, UK Visiting Professor, Offshore Wind Research and Education Center, Kyushu University Senior Researcher, Institute for Sustainable Energy Policies (ISEP) Mr. Yo Yasuda [Lecture Topics] 1. International Trends in Decarbonization and Japan's Position (1) Risks of Fossil Fuel Dependence and Decarbonization as Risk Management (2) Discussions on Decarbonization and Renewable Energy in International Organizations (3) Discussions on Decarbonization and Renewable Energy in Japan (4) Discrepancies Between International and Domestic Discussions (The U.S. is not the world) 2. International Discussions on Large-Scale Introduction of Renewable Energy (1) Electrification and Sector Coupling (Why are EVs and Heat Pumps Advancing?) (2) Externalities and Benefits (Long-Term Perspective and Risk Management) (3) Flexibility (The notion that "renewable energy is unstable" is outdated) 3. Challenges and Solutions for Japan, Methodology for Information Gathering (1) Fake News and Scientific Methodology (2) Non-Scientific Narratives and Evidence-Based Policy Making (EBMP) (3) AI and Specialized Information Retrieval 4. Q&A / Business Card Exchange *Reference: "The Future of 90% Renewable Energy by 2050 - Scenarios and Scientific Basis for Achieving Decarbonization" by Yo Yasuda, Yamato Keikokusha (December 2024)

Mar 27, 2026

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[Seminar] Strategies of the World's 25 Major Companies Surrounding Physical AI

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[Speaker] Akira Yamauchi, President and CEO of Intellectual Property Landscape Co., Ltd. Patent Attorney, AIPE Certified Senior Intellectual Property Analyst [Lecture Topics] 1. What is Physical AI? [1] Industrial Robots [2] Humanoids [3] Autonomous Vehicles as the main fields Overview of the population setting for the three fields and the key players in each field 2. [1] Industrial Robot Analysis 3. [2] Humanoid Analysis 4. [3] Autonomous Vehicle Analysis 5. Summary and Discussion of the Analysis Results for the Three Fields 6. Q&A Session

Mar 27, 2026

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