This device is designed to continuously supply slurry to a CMP device and has the capability to supply two types through two systems.
This device dilutes the slurry concentrate, supplies the slurry to the polishing equipment, controls the liquid supply temperature and pH value (optional feature), and is equipped with a mixing tank and a supply tank for continuous slurry supply. *For more details about the product, please refer to the "PDF Download" button below. *Feel free to contact us with any inquiries.
Inquire About This Product
basic information
【Specifications】 ○ Ambient temperature: 20℃ to 25℃ ○ Ambient humidity: 55% ± 15 ○ Power supply: 200℃ ○ Required water supply: 3L/min ○ Air consumption: 110L/min
Price information
-
Delivery Time
Applications/Examples of results
【Applications】 ■ Cleaning of Si wafers and compound semiconductors ■ Cleaning of LCD glass substrates ■ Cleaning of masks ■ Cleaning of hard disk substrates 【Examples of Achievements】 Used in combination with cleaning equipment
Line up（1）
| Model number | overview |
|---|---|
| P108 |
catalog（1）
Download All Catalogs
Company information
"Surely, for what is in the future." With this theme, we focus on the design and manufacturing of semiconductor manufacturing equipment and related devices, developing products that meet our customers' needs. We hope that the technologies we possess can be commercialized in various fields and be of benefit to our customers. Our entire staff is passionately engaged in the process of turning our customers' ideas into products, including research and development and prototyping. We sincerely look forward to your inquiries.
