It is a cutting-edge cathodic arc ion plating device.
The ion plating device "Jcoat -PVD-" is a cutting-edge cathodic arc ion plating device among the PVD methods, which include vacuum deposition, sputtering, and ion plating. Additionally, we offer ion plating devices using the HCD hollow cathode method, which has a proven track record in the field of cutting tools, to meet our customers' diverse needs. 【Features】 ○ Low-temperature processing ○ Strong adhesion ○ Uniform coating ○ Composite and multilayer films possible ○ High-energy plasma (hollow cathode ion plating device) ○ Smooth coating (hollow cathode ion plating device) ○ TiCN coating (hollow cathode ion plating device) *For more details, please download the PDF or feel free to contact us.
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basic information
【Features】 ○ Low-temperature treatment ○ Strong adhesion ○ Uniform coating ○ Composite and multilayer films are possible ○ High-energy plasma (hollow cathode ion plating device) ○ Smooth coating (hollow cathode ion plating device) ○ TiCN coating (hollow cathode ion plating device) ● For more details, please contact us or download the catalog.
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In all industrial sectors, the demand for surface modification technologies that can address cost reduction, resource conservation, diversification of applications, and even environmental pollution prevention is increasing. Japan Coating Center Co., Ltd. (JCC) has been providing various surface modification treatment technologies to meet the diverse needs of our customers, with the motto of "Providing technology that satisfies our customers." We were among the first to obtain ISO 9001 certification in terms of quality and functionality. We are actively engaged in the pursuit of excellent quality systems and new technologies.
