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  6. Surface atmospheric pressure plasma

Surface atmospheric pressure plasma

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last updated:Jul 25, 2013

魁半導体
魁半導体
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This is the world's first product to generate atmospheric pressure plasma on a surface.

The planar atmospheric pressure plasma can generate atmospheric pressure plasma in a planar form for the first time in the world, and it has been commercialized based on the technology invented by Professor Sakai of Kyoto University. It causes almost no damage due to heat, allowing treatment of samples that are vulnerable to heat. Since it is not in a concentrated arc state like corona discharge, it does not damage the charge of the treated objects. For more details, please download the catalog.

    Bonding EquipmentOther semiconductor manufacturing equipmentCircuit board processing machine
SKIp-CBL.jpg

Surface atmospheric pressure plasma

SKIp-CBL.jpg
SKIp-CBL.jpg
  • Related Link - http://sakigakes.co.jp/plasma_CBL-300.html

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basic information

【Features】 ○ Achieves uniform processing over a 300mm square area → Plasma is generated in a planar manner, allowing for patch processing ○ Minimal damage from heat → Can process samples that are sensitive to heat ○ Not in a concentrated arc state like corona discharge → No charge damage to the objects being processed ○ Capable of plasma generation from all gases ○ Options → Conveying mechanisms such as R to R, various coaters ○ Demo processing and equipment rental are also available ● For more details, please contact us or download the catalog.

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Applications/Examples of results

【Applications】 ○ Surface modification: Pre-treatment for various adhesive coatings ○ Surface modification: Improvement of bonding performance ○ Surface modification: Enhancement of wettability for glass, films, and resins ○ Cleaning: Cleaning of glass, films, resins, ceramics, inorganic materials, pre-treatment for plating, cleaning of electronic device substrates, etc. ● For more details, please contact us or download the catalog.

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魁半導体

魁半導体

Educational and Research Institutions

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KAI Semiconductor was established in September 2002 as a venture company originating from Kyoto Institute of Technology. It sells surface modification devices and deposition equipment using plasma technology. The powder plasma device released in 2010 was recognized for its high technical capabilities and received the "Kansai Front Runner Award" and the "Small and Medium Enterprises Technology Award." There are numerous implementation records at universities nationwide, AIST, major manufacturers, and R&D departments. We propose sales after you have had the opportunity to touch the actual product (demo unit). Additionally, we offer rental and leasing options to reduce the burden on our customers. We also accept various technical consultations beyond semiconductor-related matters. Furthermore, we process and sell quartz and Pyrex in small lots.

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  • Circuit board processing machine
          

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