The brush is cleaned with detergent (surfactants, etc.) by spinning rotation.
The "Compact Spin Cleaning Device ME-510" is a manual spinner that allows the operator to set the target workpiece manually. It performs brush cleaning with detergent (such as surfactants) through spin rotation, followed by pure water rinsing and air blow drying. The maximum rotation speed is 3000 rpm, and it accommodates sample sizes ranging from 30 to 150 mm, including PET film and glass. The brush section features brush elevation, rotation, and detergent supply, while the pure water supply section operates with a rotary air cylinder for pure water delivery. The main body dimensions are W650 x D800 x H710, and it has an aluminum frame. For more details, please contact us or refer to the catalog.
Inquire About This Product
basic information
【Specifications】 ○ Supported rotation speed: MAX 3000rpm ○ Supported sample size: 30 to 150 square, PET film and glass ○ Brush section: Brush elevation, rotation, brush rotation, detergent supply ○ Pure water supply section: Rotation by air cylinder, pure water supply ○ Air blow: Air blow drying ○ Main body size: W650 x D800 x H710, aluminum frame ● For more details, please contact us or refer to the catalog.
Price information
Please contact us.
Delivery Time
※Please contact us.
Applications/Examples of results
For more details, please contact us or refer to the catalog.
catalog(1)
Download All CatalogsCompany information
July 2009: Received certification for a research and development plan related to the advancement of manufacturing infrastructure technology for small and medium-sized enterprises from the Ministry of Economy, Trade and Industry. June 2010: Began joint development with the National Institute of Advanced Industrial Science and Technology on glass etching for solar cells. February 2011: Ordered and received an 8-inch chemical cleaning system for the 3D semiconductor research center. July 2011: Contracted by Saitama Prefecture for the next-generation industry entry support project. November 2011: Developed an alkaline spin etching system. Specifications: For large substrates (300 mm square). February 2012: Completion of the next-generation industry entry support project in Saitama Prefecture. April 2012: Newly developed silicon wafer separator for solar cells.