One-chamber multi-purpose scrub cleaning. It is possible to remove foreign substances and metal contamination in one chamber! Space-saving, making it suitable for research and development.
This is a single-chamber device that performs various sizes and types of wafers, including surfactants, pure water scrubbing, chemical spraying, megasonic spot showering, and spin drying. It is a space-saving model that allows for complete cleaning within a single cleaning layer, making it suitable for areas with limited space. Please consult us regarding single-function scrub cleaning devices. 【Features】 ■ Cleaning, rinsing, and drying can all be done in one place ■ Target wafers: silicon, quartz, oxides, compounds, etc. ■ Compatible wafer diameters: φ2” to φ4”, φ6” to φ8” *For more details, please contact us or download the catalog for more information.
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【Purpose】 ■Various wafer cleaning
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At Technical Fit Co., Ltd., we propose various cleaning devices, particle and spacer dispersion devices, static electricity removal devices, and inspection devices tailored to our customers' needs and budgets. Please feel free to consult us regardless of the industry, including LCD, semiconductors, automotive, food, and medical fields.