[Demo in progress!] Experimental device equipped with an ion source that can be customized to meet usage needs.
The "Small Experimental Ion Beam Etching Device" uses a DC ion source and is equipped with a substrate rotation cooling single stage. It easily etches materials such as Au, Pt, and magnetic materials, and taper processing can also be done easily. Processing is possible at a substrate surface temperature of 80°C or lower. It is ideal for microfabrication. 【Features】 ● No toxic gases are used, so exhaust gas treatment is unnecessary ● Endpoint detector can be installed ● For inquiries or questions about ion beam etching devices, ion sources, and ion beam technology, please feel free to consult us. For more details, please download the catalog or contact us.
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【Specifications】 ● Etching Ion Source DC 11cm Ion Source SOLUS POWER SUPPLY ● Vacuum Chamber Achievable Pressure: 6.0×10-5 Pa range Operating Pressure: 3.0×10-2 Pa range ● Single Stage Water Cooling Mechanism 3-axis Operation: Rotation, Incidence Angle, Arc Movement Selectable from irregular substrates up to Max 6 inches ● Exhaust System Main Exhaust: TMP or Cryo-pump Rough Pumping: Dry Pump or Rotary Pump For more details, please download the catalog or contact us.
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Company information
Our company started in 1988 as an overseas export trading company for vacuum thin film manufacturing equipment, and has expanded its operations as a "total planner of vacuum technology" up to the present day. During this time, we have focused on the development of optical thin film materials, as well as the sales of ion beam processes and refrigeration units (Sapcold). Additionally, we have developed and are set to launch the GCIB (Gas Cluster Ion Beam) process equipment, which is expected to be an important technology in the next generation of nano-processing. Starting with glasses and camera lenses, we now see new media continuously emerging in the optical-related industry, including digital cameras, mobile phones, and medical lenses.
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