Contributes to shortening development/delivery times and reducing costs in the exposure processes of semiconductor manufacturing.
In the exposure technology used in semiconductor manufacturing processes, micro-sensor (accelerometer, pressure sensor, temperature sensor, gas sensor) manufacturing processes, and printed circuit board manufacturing processes, the mainstream method involves using photomasks to transfer patterns onto substrates. On the other hand, the maskless exposure device "MX Series" employs a unique point array method using DMD (Digital Micromirror Device), allowing for direct exposure from CAD data. This exposure method, which does not use photomasks, achieves world-class exposure precision (below 1 micron). It facilitates easier prototyping and contributes to reductions in time and cost. 【Features】 ○ Expensive masks are no longer necessary ○ Prevention of external leakage of mask data ○ Reduced time from design of drawing patterns to actual drawing ○ Easy modification of drawing pattern designs ○ Correction of exposure patterns to match the distortion of each substrate is possible - For more details, please contact us or download the catalog.
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basic information
【Main Specifications】 ○Model: MX-1201 / MX-1201E / MX-1205 ○Minimum Line Width: 5μm / 3μm / 1μm ○Data Resolution: 0.5μm / 0.25μm / 0.05μm ○Maximum Substrate Size (mm): 200x200 / 200x200 / 100x100 ○Effective Exposure Area (mm): 200x200 / 200x200 / 100x100 ○Laser Wavelength (nm): 405±5 / 375±5 / 405+375±5 ○Exposure Scan Speed (mm/s): 43.9 / 22.5 / 4.5 ○Number of Optical Engines (units): 1 / 1 / 1 ●Sizes can be discussed upon request. ●For more details, please contact us or download the catalog.
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Since our founding, we have utilized and passed down the skills of artisans while establishing cutting-edge technology. With "quality first" and "customer priority" as our guiding principles, we strive to create products that bring joy to our customers, and thanks to the exceptional guidance and support from many, we have steadily grown to this day. We possess unique technologies in optics, precision mechanisms, electronic control, and software, and we are committed to improving our technical capabilities, particularly in exposure equipment, which is a combination of optomechatronics technologies. Additionally, we have obtained ISO 9001 and KES certifications as part of our commitment to quality and environmental management. Moving forward, we will continue to focus on creating equipment that can respond to our customers' needs in a timely manner, with an emphasis on "high quality," "short delivery times," and "low costs."
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