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  1. Home
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  3. Manufacturing and processing machinery
  4. Semiconductor Manufacturing Equipment
  5. Other semiconductor manufacturing equipment
  6. Maskless exposure device "ME-120F"

Maskless exposure device "ME-120F"

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ME-120F

last updated:Oct 11, 2023

ピーエムティー 本社・工場
ピーエムティー 本社・工場
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Supports up to 12-inch wafers! Direct drawing compatible with general-purpose CAD eliminates the costs and time associated with photomask production!

◆Solving the Challenges of Photolithography with Direct Drawing The maskless exposure device performs direct drawing on the workpiece using a DMD (Digital Micromirror Device). By eliminating the enormous costs and time required for photomask production, the challenges of traditional photolithography processes are resolved, making the prototyping of semiconductor devices more accessible. ◆Selectable Exposure Modes Since 2016, a fine exposure mode utilizing pixel interpolation technology has been standard. While the throughput time is longer compared to the standard exposure mode, the data reproducibility of diagonal lines and curved patterns is significantly improved. ◇What is DMD? DMD refers to hundreds of thousands of tiny mirrors arranged in a grid pattern. By illuminating these mirrors and controlling each one ON/OFF, image data created with general-purpose CAD is projected onto the workpiece. The light source uses LED light, which is long-lasting and economical.

    Other semiconductor manufacturing equipment
ME-1.png

Maskless exposure device "ME-120F"

ME-1.png
ME-1.png
  • Related Link - https://pm-t.com/products/me-120f/

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Device Specifications Device Dimensions: W2,000 × D1,300 × H2,000 mm Device Weight: Main Unit 1300 kg Base Plate: Max 300 mm Wafer Exposure Method: Scan Exposure Method Light Source: LED (Light Source Wavelength λ = 385 nm) Overlay Accuracy: Within ±0.5 μm Exposure Resolution: L/S 0.5 μm / L/S 0.1 μm (when using Fine Exposure Mode)

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■For universities and research institutions Target work: wafers, films, etc.

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Maskless Exposure Device "ME-120F"

Maskless Exposure Device "ME-120F"

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PMT axis control technology

PMT axis control technology

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ピーエムティー

ピーエムティー 本社・工場

Industrial Machinery

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In September 1991, PMT Corporation was founded as a general trading company for semiconductor manufacturing equipment. Since then, after processing parts and designing and manufacturing molds, we established ultra-precision axis control technology. We have leveraged this as our strength and applied it to various machines and devices, including the nano-stage system, NC fine processing machines, and maskless exposure devices. Currently, we are also engaged in automation systems specialized for the life sciences sector and robotics projects that solve challenges in manufacturing sites, continuing to create products that transcend industry boundaries. Our motto is, "What shall we create with PMT?" Please let us know your requests first.

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