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  1. Home
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  3. Manufacturing and processing machinery
  4. Semiconductor Manufacturing Equipment
  5. Other semiconductor manufacturing equipment
  6. Ion Plating Device "SIP-1600"

Ion Plating Device "SIP-1600"

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last updated:Jun 19, 2015

昭和真空
昭和真空
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For customers considering the drying and increased production of decoration and painting.

The ion plating device "SIP-1600" is a machine for depositing metal films onto resin substrates. It is capable of depositing two types of materials in the same batch. It comes with two internal jigs and carts, providing high productivity. The ion plating mechanism allows for smooth film deposition. 【Features】 ○ Depending on the size of the workpiece, either a 6-axis or 8-axis self-rotation jig can be installed. ○ The resistance heating evaporation source is equipped with switchable electrodes (2 sets). ○ An ion plating mechanism is included. ○ Two jig carts are standard equipment. ○ The installation of a refrigeration unit has improved the exhaust speed for H2O. For more details, please contact us or download the catalog.

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18_sip1600.jpg

Ion Plating Device "SIP-1600"

18_sip1600.jpg
18_sip1600.jpg
  • Related Link - http://www.showashinku.co.jp/product/e_SIP-1600.ht…

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【Specifications】 ○Achievable Pressure: 10-4 Pa ○Exhaust Speed: Up to 6.7×10-3 Pa within 20 minutes from atmospheric pressure ○Internal Fixture: Self-rotating type, 6 axes (Φ440mm×H1650mm/work mounting area) 8 axes (Φ360mm×H1650mm/work mounting area) ○Self-Rotation Speed: 6 axes: self-rotation 11–33 rpm / revolution 1–3 rpm 8 axes: self-rotation 13–37 rpm / revolution 1–3 rpm ○Vacuum Chamber: Φ1600mm×H2300mm (made of SS400) ○Footprint: W4700mm×D7000mm×H3100mm 【Required Specifications】 ○Required Power: Main unit: Φ3 200V approximately 12KVA, resistance evaporation source: Φ1 200V 40KVA ○Required Water Volume: 0.2MPa or more (differential pressure), 4.8 m³/h, 20–25℃ ※Maximum pressure at cooling water inlet: below 0.4MPa, water quality equivalent to municipal water ○Required Air Pressure: 0.5MPa or more, connection diameter 8A (Rp3/4), 70NL/min ○Gas Pressure: 0.03MPa (set pressure 0.02MPa), connection diameter SWL1/4 ●For more details, please contact us or download the catalog.

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Applications/Examples of results

【Applications】 ○ Various decorative films ○ Discontinuous films ○ Electromagnetic wave prevention films ● For more details, please contact us or download the catalog.

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Ion Plating Device SIP-1600 - Ideal for Decoration and Coating

Ion Plating Device SIP-1600 - Ideal for Decoration and Coating

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昭和真空

昭和真空

Industrial Machinery

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Showa Vacuum Co., Ltd. manufactures and sells vacuum technology application devices (vacuum equipment) such as vacuum deposition devices and sputtering devices, primarily focused on equipment that forms thin films on specific substrates in a vacuum.

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