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  6. High-intensity excimer UV device

High-intensity excimer UV device

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last updated:Dec 12, 2016

ブルーオーシャンテクノロジー
ブルーオーシャンテクノロジー
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Rental-only excimer UV - Long-term rental available from 15 days to over 1 year - Monthly installment payments are possible - No repair costs for the equipment will be incurred.

**Advantages of Rental** - Difficult to introduce equipment - When existing equipment breaks down - When an excimer UV device is urgently needed - Want to reduce maintenance, upkeep, property tax, and management costs - New equipment introduction possible: Please consult separately **Features** - High brightness and high uniformity due to high-intensity RF discharge method - Direct irradiation on the lamp tube surface without electrodes or quartz windows on the irradiation surface - Excimer lamps can be lit even in a vacuum environment - Significant reduction in nitrogen usage due to unique slit holder - Adjustable illuminance for each lamp - Effective lamp length: up to MAX G10 size **Electrode-less Irradiation Unit & N2 Slit Holder Structure** The lamp structure does not have electrodes on the irradiation surface side, resulting in no obstruction of light and minimal transmission or reflection losses, making it highly efficient. Nitrogen (CDA) is ejected along the lamp tube wall from individual lamp holders. This efficiently generates ozone and allows for uniform control of oxygen concentration with a small amount. **Main Applications** - Cleaning and surface modification of glass, films, and wafers - Bonding of films, glass, resins, metals, etc. - HDD cleaning, modification, and lubricant hardening - Resist removal and ashing - Cleaning of chip, film, and substrate bonding surfaces

    Coater
実験機画像2.jpg

High-intensity excimer UV device

実験機画像2.jpg
実験機画像2.jpg

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basic information

**Advantages of Rental** - Difficult to introduce equipment - When existing equipment breaks down - When an excimer UV device is urgently needed - Want to reduce maintenance, upkeep, property tax, and management costs - New equipment introduction possible: please consult separately **Features** - High brightness and high uniformity due to high-intensity RF discharge method - Direct irradiation on the lamp tube surface without electrodes or quartz windows on the irradiation surface - Excimer lamps can be lit even in a vacuum environment - Significant reduction in nitrogen usage due to unique slit holder - Adjustable illuminance for each lamp - Effective lamp length: up to MAX G10 size **Electrode-less Irradiation Unit and N2 Slit Holder Structure** The lamp structure does not have electrodes on the irradiation surface side, resulting in no obstruction of light and minimal transmission or reflection losses, making it highly efficient. Nitrogen (CDA) is ejected along the lamp tube wall from individual lamp holders. This efficiently generates ozone and allows for uniform control of oxygen concentration with a small amount. **Main Applications** - Cleaning and surface modification of glass, film, and wafers - Bonding of films, glass, resin, metals, etc. - HDD cleaning, modification, and lubricant curing - Resist removal and ashing - Cleaning of chip, film, and substrate bonding surfaces

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Applications/Examples of results

**Features** - High brightness and high uniformity due to high-intensity RF discharge method - Direct irradiation on the lamp tube surface without electrodes or quartz windows on the irradiation surface - Excimer lamps can be lit even in a vacuum environment - Significant reduction in nitrogen usage due to unique slit holder - Adjustable illuminance for each lamp - Effective lamp length: up to MAX G10 size **Electrode-less Irradiation Unit & N2 Slit Holder Structure** The lamp structure does not have electrodes on the irradiation surface, resulting in no obstruction of light and minimal transmission or reflection losses, leading to high efficiency. Nitrogen (CDA) is ejected along the lamp tube wall from individual lamp holders. Ozone is efficiently generated, allowing for uniform control of oxygen concentration with a small amount. **Main Applications** - Surface modification for cleaning glass, film, and wafers - Bonding of films, glass, resins, metals, etc. - HDD cleaning, modification, and lubricant curing - Resist removal and ashing - Cleaning of chip, film, and substrate bonding surfaces **Examples of Equipment Installation** - Pre-cleaning equipment for G8 size TFT substrates - Roll-to-roll cleaning equipment - Resist ashing equipment

Company information

ブルーオーシャンテクノロジー

ブルーオーシャンテクノロジー

Industrial Machinery

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We provide manufacturing equipment sales, proposals, and services unique to a "technical trading company" that has design know-how and contract/manufacturing partners. We have accumulated achievements through experiments and development with optimal selections tailored to our customers' needs. We will continuously develop new innovative technologies and applied technologies. We offer high-value-added proposals that encompass equipment sales, contract rental services, and consumable parts sales.

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