More than 10 types of semiconductor gases can be freely controlled! Customizable.
Supports various uses such as vertical type, sheet, wafer size, gas type, and footprint. This is a high-grade vertical reduced pressure CVD system focused on versatility. It can also be customized based on standard specifications to be manufactured at a lower cost. 【Features】 ■ Supports wafer sizes of 3", 6", and 8" with a small footprint ■ Reduces natural oxidation with heater lifting function ■ Achieves stable temperature control from room temperature to 900℃ *For more details, please contact us or download the PDF for more information.
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We want to be of help, even if just a little, to the researchers who are pouring their souls into the development of new technologies. From this desire, our company is focusing its technology on the development, maintenance, and customization of CVD equipment. It has been about 35 years since semiconductor manufacturing equipment arrived from America, and we have been involved in the industry since its dawn. We have received much advice from many researchers and have accumulated technical expertise in hardware, which we believe allows us to offer unique contributions.