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  3. Manufacturing and processing machinery
  4. Semiconductor Manufacturing Equipment
  5. Sputtering Equipment
  6. Simple experimental sputtering device

Simple experimental sputtering device

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last updated:Dec 16, 2019

神港精機 東京支店
神港精機 東京支店
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Two models: manual batch type and simple load lock type. The simple load lock type enables the mass production process of compound semiconductors. Currently accommodating sample tests and equipment tours.

This product is a simple and cost-effective sputtering device that covers everything from basic research to advanced process development. We offer two models: a fully manual, low-cost batch type and a simplified load lock type equipped with a manual transport mechanism. Both models achieve significant cost reductions while maintaining the process performance of higher-end models. We provide consistent and careful support from sample testing and specification compliance to post-delivery follow-up. 【Features】 ■ Reasonable cost and high process performance ■ High reliability capable of handling small-scale production ■ A wide range of options and flexible hardware support backed by extensive track records ■ Supports process development in advanced thin film development with load lock mechanisms and pre-deposition testing ■ A demo unit is permanently available for sample testing *For more details, please refer to the PDF document or feel free to contact us.

    Sputtering EquipmentPlasma surface treatment equipment
2019-06-14_19h09_30.jpg

Simple experimental sputtering device

2019-06-14_19h09_30.jpg
2019-06-14_19h09_30.jpg 2019-06-14_19h09_39.jpg
  • Related Link - http://www.shinko-seiki.com/
  • Special site - Product/service details - https://pr.mono.ipros.com/shinko-seiki/product/

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basic information

【Other Features】 ■ Batch Type - Fully automated and cost-effective - Achieves sufficient process performance for small-scale production on compact substrates - Ensures hardware reliability and film quality stability ■ Simple Load Lock Type - Equipped with a manual transport mechanism - Clean and high vacuum performance - Uniform film thickness, plasma, and heating distribution performance - Capable of forming high-crystallinity nitride films (AlN) and high-reflectivity metal films - Creation of AlN templates for UV LEDs *For more details, please refer to the PDF document or feel free to contact us.

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Applications/Examples of results

【Applications】 Formation of compound semiconductor electrodes and insulating films. Creation of AlN templates for UV LEDs. Formation of various thin films for small electronic devices. *For more details, please refer to the PDF document or feel free to contact us.*

catalog(8)

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Catalog of Simple Experimental Sputtering Equipment

Catalog of Simple Experimental Sputtering Equipment

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Heat treatment device for electronic devices

Heat treatment device for electronic devices

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R&D use load-lock type sputtering equipment

R&D use load-lock type sputtering equipment

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Vacuum Deposition Device "AMF-850SPB Model"

Vacuum Deposition Device "AMF-850SPB Model"

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Standard Batch Type Sputtering Equipment Catalog (SRV Series)

Standard Batch Type Sputtering Equipment Catalog (SRV Series)

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Catalog of Simple Experimental Deposition Equipment

Catalog of Simple Experimental Deposition Equipment

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UV-LED AlN Template Manufacturing Equipment Brochure

UV-LED AlN Template Manufacturing Equipment Brochure

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Simple experimental sputtering device model SRV3100

Simple experimental sputtering device model SRV3100

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Company information

神港精機

神港精機 東京支店

Industrial Machinery

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Shinko Seiki, as a technology-driven manufacturer, leverages the numerous know-how accumulated particularly in the field of vacuum equipment to deliver innovative products that meet user needs. In recent years, the company has also been challenging cutting-edge fields such as electronics and new materials, aiming to develop truly valuable hardware and software through the advancement of distinctive technologies and their organic integration.

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