Compact-type sputtering device exclusively for small substrate, achieving low cost with fully manual operation. Standard type for research and experiments.
Commonization of high-reliability upper models with vacuum chambers and exhaust systems. Cost reduction achieved through manual operation methods. Various components (cathodes, substrate holders, etc.) can be selected according to the type of film and purpose. The efficiency and quality of research and development work can be improved with the well-established mechanisms and stable film deposition performance.
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basic information
Film Formation System: φ3-inch cathode, single source equipment : High-frequency power supply, single source equipment : Substrate heating mechanism, standard equipment : Exhaust system, diffusion pump & oil rotary pump Operation System: Fully manual Optional Mechanisms: Cathode for magnetic materials, conventional cathode, DC bias Reverse sputtering mechanism, bias sputtering mechanism, high-temperature substrate heating Main pump change (adoption of turbo molecular pump) Fully automated
Price information
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Applications/Examples of results
Basic research at universities and public institutions Compound semiconductor research Research and development of metal and ceramic surface treatment
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Company information
Shinko Seiki, as a technology-driven manufacturer, leverages the numerous know-how accumulated particularly in the field of vacuum equipment to deliver innovative products that meet user needs. In recent years, the company has also been challenging cutting-edge fields such as electronics and new materials, aiming to develop truly valuable hardware and software through the advancement of distinctive technologies and their organic integration.
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