Compatible with 3-inch wafers! It features a compact design that achieves space-saving.
This product is a CVD device for depositing silicon oxide. It features a compact design that achieves space-saving. The internal surface treatment is electropolishing, and the chamber material is SUS316. Additionally, it is compatible with 3-inch wafers. 【Features】 ■ Deposits silicon oxide ■ Compact design that achieves space-saving ■ Compatible with 3-inch wafers *For more details, please refer to the external link page or feel free to contact us.
Inquire About This Product
basic information
【Specifications】 ■ Vacuum Exhaust: Turbo Pump ■ Heater: SiC MAX 1200℃ ■ Water Cooling: Peripheral Coil, Upper Flange Jacket ■ External Dimensions: φ360 x 500H ■ Internal Surface Treatment: Electrolytic Polishing ■ Gasket: Gold-Plated Copper Gasket ■ Chamber Material: SUS316 ■ Gas Discharge Substrate Length Adjustable: 0mm to 50mm *For more details, please refer to the external link page or feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
For more details, please refer to the external link page or feel free to contact us.
catalog（1）
Download All Catalogs
Company information
Izumi Tech Co., Ltd. primarily engages in the sale of scientific and physical instruments, and also conducts design and manufacturing activities as a trading company capable of producing goods. We specialize in manufacturing related to new industrial materials, environment, science, physics, electricity, architecture, and civil engineering. Please feel free to contact us if you have any requests.