It is a device with numerous achievements in mass production of power devices, LEDs, MEMS, etc.
The range of membrane quality control is very broad, allowing us to meet the various membrane quality requirements of our customers. Additionally, we have achieved stable automatic transport for compound wafers and special wafers, which had issues with conventional equipment, contributing to improved yield. In our company, we actively customize each device to reflect our customers' requests as much as possible. We have a demonstration machine permanently installed in-house, so please feel free to consult with us.
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basic information
Our equipment is a batch-type device that performs film deposition on multiple wafers in a single process. Film types: Deposition of SiN/SiO2/SiON is possible. Please consult us regarding other materials such as TEOS-SiO2. Wafer size: Up to 8 inches There are no restrictions for sizes smaller than 8 inches. Uniformity: Within ±3% Including batch-to-batch reproducibility, it will be within ±3%.
Price range
P8
Delivery Time
Applications/Examples of results
Applications Compound sensors / LED / SiC・GaN power devices / MEMS Examples of achievements - Stable mass production of brittle wafers - Low-stress film deposition on thin wafers (100μm) - High-voltage film deposition through low-speed (5nm/min or slower) deposition - Improvement of wafer warping through stress control - Equipment compatible with both 4-inch and 6-inch wafers
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Company information
Regarding the PE-CVD equipment, please feel free to contact us for improvements in film quality and customization of the equipment. In mass production of compound semiconductors and power devices, there are many issues related to film quality and wafer handling with the PE-CVD used in memory mass production. Our company has extensive experience in mass production support for compound semiconductors and special wafers, so we will propose the best specifications for the equipment that you will use.
![[Data] Silicon processing data using the non-bosch process](https://image.mono.ipros.com/public/product/image/c8d/2000499800/IPROS02347582528443700539.png?w=280&h=280)
![[Data] - Example of ICP Etching Process for MicroLEDs](https://image.mono.ipros.com/public/product/image/514/2000499814/IPROS23208611525336548350.png?w=280&h=280)
