We will introduce the trench processing of GaN based on our past processing achievements.
Our company has a proven track record as a semiconductor manufacturing equipment manufacturer, providing ICP etching equipment, CVD equipment, and process technology for the production of GaN-based light-emitting devices. We also offer equipment capable of trench processing and mesa processing for 4H-SiC power devices. This document introduces the trench processing of GaN based on our past processing achievements. [Contents] ■ Introduction ■ Schematic diagram of trench MOSFET ■ Trench processing of GaN ■ Etching results ■ Conclusion *For more details, please refer to the PDF document or feel free to contact us.
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We excel in the technology of thin film formation and processing at the nano to micro level, and we are well-regarded for providing equipment and technology for both research and development applications as well as production purposes. Additionally, we specialize in the optoelectronics field, particularly in light sources (LEDs and semiconductor lasers), which are expected to see market expansion in the future.