A DLC film with high infrared transmittance is formed on both sides of the substrate at a high rate. Achieving next-generation IR coating with stable hard and advanced soft materials.
Expanding the PIG-type DLC film formation device, which has a proven track record in hard films and surface treatment applications, for infrared optical applications. A DLC film with over 90% high transmittance is formed uniformly on both sides of the substrate, achieving hard, high-transmittance DLC films with high productivity.
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basic information
Equipped with a self-developed high-density plasma source (PIG plasma source) High-rate full-area film formation mechanism using a self-rotation mechanism Comprehensive software compatible with various infrared optical elements
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Applications/Examples of results
Infrared sensor module cover glass
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| Model number | overview |
|---|---|
| APIG-1060D Type | High-density plasma CVD equipment with a uniquely developed plasma gun that enables the deposition of DLC films with excellent infrared transmittance at high productivity. Capable of supporting small-scale production of infrared anti-reflection films for research and development. A sputter cathode can also be optionally equipped, making it a versatile high-density plasma CVD device. |
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Company information
Shinko Seiki, as a technology-driven manufacturer, leverages the numerous know-how accumulated particularly in the field of vacuum equipment to deliver innovative products that meet user needs. In recent years, the company has also been challenging cutting-edge fields such as electronics and new materials, aiming to develop truly valuable hardware and software through the advancement of distinctive technologies and their organic integration.
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