For coating semiconductor manufacturing equipment components such as chambers! Silica coat.

Coating metal with high-purity silica glass! Oxidation is suppressed, and corrosion resistance is improved! Metal contamination is reduced, enhancing product quality and yield in advanced processes!

Quartzace," which has a proven track record in coating semiconductor manufacturing equipment components such as chambers, can accommodate various substrates including metals, resins, rubber, and biological materials. It allows the characteristics of the substrate to be utilized while obtaining the properties of silica glass only on the surface. For example, when coated on metal, it provides excellent corrosion resistance against hydrochloric gas and other substances. Additionally, it can prevent the oxidation of metals at high temperatures. By transforming the metal surface to a synthetic quartz-like SiO2, it can solve the problem of metal contamination. In advanced semiconductor manufacturing processes, even trace amounts of metal contamination can significantly affect product quality and yield. Therefore, coating chambers, surrounding parts, flanges, and other components greatly improves maintenance cycles. 【Overview】 ■Composition: SiO2 ■Film Thickness: 0.1 to 3 μm ■Heat Resistance: 350℃ (-196℃ to 900℃) ■Purpose: Corrosion prevention, metal contamination prevention (excluding F-type gases) *For more details, please download the PDF or feel free to contact us.

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