High Vacuum Substrate Heating Device "SP-1321"

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last updated：Aug 17, 2020

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Compact size that can be installed on a desk! Suitable for university research labs.

The SP-1321 is a device for heating small substrates in high vacuum. By incorporating a load lock chamber, it is possible to keep the heating chamber in a clean state at all times. In addition to enabling heating in high vacuum, it achieves stable temperature control through programmed temperature control. Its compact size allows for installation on a desk, making it suitable as an experimental device in research laboratories. 【Features】 - Heats small substrates in high vacuum - Capable of heating in high vacuum - Heater temperature can reach 500°C (Max 800°C) - Achieves stable temperature control through programmed temperature control - Various ports of the heating chamber utilize ICF70 flanges to accommodate high vacuum *For more details, please refer to the PDF document or feel free to contact us.

Related Link - http://www.science-p.jp/article/15180621.html

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【Other Features】 - Free combination with or without a load lock chamber, and with your existing exhaust unit, vacuum gauge, and valves. - If you already have an exhaust unit, vacuum gauge, or valves, it is also possible to combine them with these devices. - To keep the heating chamber in a clean state, a manual fixture for substrate transport can be equipped with the load lock chamber. *For more details, please refer to the PDF materials or feel free to contact us.