Effective area of a 25mm side triangle! It forms a composition distribution of hundreds of conditions on a single substrate.
The "CMS-6420" is a 6-component combinatorial magnetron sputtering device developed to expand the film deposition area, which has been difficult to achieve with the PLD method. The effective area is a triangle with sides of 25mm. Since it uses a 4-inch wafer as the standard substrate, it can be integrated into subsequent processes such as patterning and etching, enabling high throughput not only for film deposition but also for analysis. 【Features】 ■ Compatible with 4-inch wafers suitable for process lines ■ Effective area: triangle with sides of 25mm ■ Supports binary and ternary combinatorial film deposition ■ LabVIEW recipe input and automatic film deposition ■ Maximum 6-component configuration (6 units of 2-inch cathodes for matrix use) *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Basic Specifications (Partial)】 ■ 6 units of 2” magnetron sputter cathodes ■ Load lock system compatible with 4” wafer cassettes ■ Creation of ternary combination samples with 25mm edges ■ Precision moving mask mechanism and substrate rotation mechanism compatible with ternary combinations ■ Supports co-sputtering film deposition ■ Automatic pressure control ■ Process parameter logging function, etc. *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Our company was established as a certified venture originating from the National Institute for Materials Science (NIMS) and is engaged in the development of new functional materials using combinatorial thin film deposition technology. By creating a combinatorial library that contains all combinations of compositions on a single sample substrate, we significantly shorten the development period for functional materials and enhance the development process through high throughput.
