A composition distribution with several hundred conditions is formed on a single substrate. The effective film formation area is an equilateral triangle with a side length of 25 mm.
The "CMS-3200" is a three-component combinatorial magnetron sputtering device that supports binary and ternary combinatorial composition gradient film deposition. The effective area is an equilateral triangle with a side length of 25mm. It is designed to use 2-inch wafers as standard substrates, allowing for integration into post-processing steps such as patterning and etching, enabling high throughput not only for film deposition but also for analysis. 【Features】 ■ Supports binary and ternary combinatorial composition gradient film deposition ■ Effective film deposition area: equilateral triangle with a side length of 25mm ■ Equipped with three 2-inch magnetron sputter cathodes ■ Can accommodate up to six RF and DC power supplies in three sets ■ Recipe editing and fully automated combinatorial film deposition using LabView *For more details, please refer to the PDF document or feel free to contact us.
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【Basic Specifications (Partial)】 ■ Three 2” matrix sputter guns ■ Sputter cathode for ferromagnetic materials ■ 2” wafer cassette load lock system ■ Creation of ternary combination samples with 25mm sides ■ Mask system compatible with ternary composition gradient film deposition ■ Supports co-sputtering film deposition ■ Automatic pressure control ■ Process parameter logging function, etc. *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Our company was established as a certified venture originating from the National Institute for Materials Science (NIMS) and is engaged in the development of new functional materials using combinatorial thin film deposition technology. By creating a combinatorial library that contains all combinations of compositions on a single sample substrate, we significantly shorten the development period for functional materials and enhance the development process through high throughput.