High-speed pattern generator
The "VPG+ Series" is a high-speed exposure system that can accommodate large mask manufacturing, resist master creation, and direct drawing on various flat substrates due to its fast exposure speed. It can be utilized in fields that require semiconductors, displays, sensors, MEMS, advanced packaging, LED production, life sciences, and microfabrication. 【Features】 ■ High resolution ■ High image quality ■ High throughput ■ Ideal for high-speed photomask production ■ Capable of direct drawing on any flat substrate *For more details, please refer to the catalog or feel free to contact us.
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basic information
【Drawing Performance】 ■Minimum Drawing Size [μm]: 0.75 ■Edge Roughness [3σ, nm]: 40 ■CD Uniformity [3σ, nm]: 65 ■Overlay Accuracy [3σ, nm]: 225 ■Compatible Substrate Size: Up to a maximum of 1,400mm square *For more details, please refer to the catalog or feel free to contact us.
Price range
P9
Delivery Time
Applications/Examples of results
【Applications】 ■ Mask creation and patterning on wafers, etc. ■ Maskless exposure, direct writing, direct drawing ■ Patterning for semiconductors, FPD, sensors, MEMS, microchannels, micro-optics, waveguides, and more ■ Other applications requiring microstructure fabrication *For more details, please refer to the catalog or feel free to contact us.
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Heidelberg Instruments, Inc. is the Japanese subsidiary of Heidelberg Instruments Mikrotechnik, a German company that develops and manufactures laser direct writing systems and mask writing systems. We provide sales and technical services for laser direct writing systems within Japan. We offer a wide range of products, including laser writing systems and maskless aligners. For anything related to laser lithography, please feel free to consult with us.