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  6. Plasma CVD film deposition

Plasma CVD film deposition

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last updated:May 18, 2021

東邦化研
東邦化研
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Forming a dense thin film by chemically reacting gases! Low-temperature processing is also possible.

The plasma CVD method is a technique that involves exciting or decomposing a gas containing the desired elements for the film using plasma, which then adsorbs and reacts on the substrate surface to form a film. Because it uses plasma, it allows for film formation at lower temperatures compared to thermal CVD. Additionally, it is characterized by better conformality on uneven surfaces compared to ion plating, vacuum deposition, and sputtering methods. Our company offers coating services using the plasma CVD method, in addition to ion plating and vacuum deposition methods. Currently, the types of films available using the plasma CVD method are four types: DLC (Diamond-Like Carbon), SiO2, SiN, and SiC.

    WaferCVD EquipmentProcessing Contract
equip_plasma.jpg

Plasma CVD film deposition

equip_plasma.jpg
equip_plasma.jpg
  • Related Link - http://www.tohokaken.jp/plasma-cvd.html

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■Supported film types: DLC, SiO2, SiN, SiC ■Maximum possible size: φ12 inches × t20mm ■Compatible substrates  ・Si Wafer  ・Glass  ・Film  ・Ceramics  ・Metal materials   Others

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東邦化研

東邦化研

Electronic Components and Semiconductors

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Our company offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. Since our inception, we have focused on "functional thin films" such as conductivity, insulation, and corrosion resistance. We accommodate various types of films, including metal films, reactive films like oxide, carbide, and nitride films, as well as their laminated films. We have established a system to respond to a wide range of requests, from small-scale prototypes, development, and research to medium-sized production runs. Currently, we have 11 deposition devices in operation, ranging from small machines with a diameter of 300mm to inline mass production machines with a film formation area of 1000mm x 900mm. All processes, from the unboxing of substrates entrusted by customers to the packaging of the coated products, are conducted within a clean room. If you are considering functional thin films, please feel free to contact us! Based on our flexible response and over 35 years of experience, we will meet your needs! *Information about our exhibition participation is also available on our website. Please take a look.

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