The substrate size is up to φ12 inches! Using our unique CO2 rubber jet nozzle.
The "CO2 Spray Cleaning Device" allows for CO2 cleaning in a low dew point environment for cleaning in a vacuum environment. It uses our proprietary nozzle, the CO2 Rubber Jet Nozzle. The speed and density of solid CO2 particles can be varied, enabling us to propose optimal cleaning conditions. It can be used for particle removal on micro lenses, removal of sputter residues, and improvement of wettability. 【Features】 ■ Our proprietary nozzle: CO2 Rubber Jet Nozzle ■ Cleaning in a vacuum environment ■ Damage-free dry cleaning is possible ■ Maximum substrate size is φ12 inches ■ Handheld spray unit available for sale *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Cleaning Principles】 1. Chemical Cleaning Action - Removal of organic substances utilizing the chemical properties (solubility) of liquid CO2 particles. 2. Physical Cleaning Action - Removal of foreign substances utilizing the physical blasting effect from the collision of solid CO2 particles. *For more details, please refer to the PDF materials or feel free to contact us.
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Applications/Examples of results
【Applications】 ■CCD Sensor: Particle removal on micro lenses ■MEMS: Removal of sputter residues, improvement of wettability *For more details, please refer to the PDF document or feel free to contact us.
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Company information
Japan Create has been challenging cutting-edge technologies to respond to the diversification of the semiconductor industry with high precision, labor-saving, and miniaturization. We seek infinite possibilities in high technology and create reliable know-how that matches user needs with our uniqueness. We will continue to strive towards high-level technology.