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  4. Semiconductor Manufacturing Equipment
  5. Sputtering Equipment
  6. Achieving high-level DLC film deposition with proprietary sputtering technology!

Achieving high-level DLC film deposition with proprietary sputtering technology!

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last updated:Jul 02, 2024

京浜ラムテック
京浜ラムテック
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DLC film formation (film quality: ta-C domain, surface roughness Ra 0.16 nm, transmittance: 88%) achieved through sputtering, which has had many challenges in the past.

The RAM CATHODE (four-sided opposing cathode) dramatically improves the ionization rate, allowing for the formation of DLC (ta-C) using a DC pulse power supply without the need for HIPIMS power supply. 【Conventional Sputtering Method】 Due to the low ionization rate of carbon, it was necessary to use HIPIMS power supply to forcibly increase the ionization rate in order to obtain the ta-C region. 【RAM Cathode Developed by Our Company】 By arranging targets on four opposing sides, it is possible to enhance the confinement of plasma due to the magnetic field between the targets, resulting in the formation of high-density plasma. Within the confined plasma, the collisions between electrons, rebounding argon, and C flux promote the ionization of Ar ions and C flux, making it easier to form C-C bonds in the DLC film. As a result, we have achieved the formation of high-hardness and high-smoothness DLC without using HIPIMS power supply. *For more details, please refer to the PDF document or feel free to contact us.

    Sputtering Equipment
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Achieving high-level DLC film deposition with proprietary sputtering technology!

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**Features** - DLC Formation: The ionization rate is higher than that during formation using conventional sputtering methods. In a plasma confined by four opposing targets, electrons, recoiling argon, and C flux repeatedly collide with each other, promoting the ionization of Ar ions and C flux. C+ facilitates ionization at high energy due to ion collisions, making it easier to form C-C bonds in the DLC film. - "Transmittance," "hardness," and "surface roughness" are improved.

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【Examples of Use】 Smartphone cover glass Food film Medical fabric/polymer Syringes and drug containers Artificial joints Infrared cameras and infrared sensors Etc.

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Effectiveness of RAM CATHODE sputtering in DLC (4-sided facing sputter cathode)

Effectiveness of RAM CATHODE sputtering in DLC (4-sided facing sputter cathode)

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京浜ラムテック

京浜ラムテック

Manufacturing and processing contract

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Keihin Ramtech was founded in 1972 and has become a trusted manufacturer in the liquid crystal and semiconductor manufacturing equipment industry as well as the automotive industry. At our company, we believe that continuous technological development is the responsibility of all employees. The unique technology possessed by Keihin Ramtech is utilized as core technology across various industries. As a proposer that continues to develop and propose innovative technologies expected to further advance in the future, we contribute to our customers' continued growth.

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