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  1. Home
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  3. Scientific and Physics Equipment
  4. Surface Treatment Equipment
  5. Plasma surface treatment equipment
  6. Atmospheric non-exposure multi-sputtering device

Atmospheric non-exposure multi-sputtering device

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SRV3320 model

last updated:Sep 29, 2021

神港精機 東京支店
神港精機 東京支店
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Sulfur compound compatibility available. Dedicated film deposition device for research on thin-film solid-state batteries. Comprehensive support from target to film deposition testing, including dedicated equipment. Standard glove box included.

Dedicated sputtering equipment for research on thin-film solid-state secondary batteries. Post-processing is possible. It allows for the simultaneous formation of the anode, electrolyte, and cathode using a multi-component cathode, as well as sealing the substrate to prevent exposure to the atmosphere after film formation. Pre-film tests using a dedicated Li target are also available (for a fee). Comprehensive support for materials (targets), soft (film formation tests), and hard (dedicated equipment). Sulfide targets and dedicated glove boxes can also be equipped, achieving both versatility and individual customization.

    Sputtering EquipmentPlasma surface treatment equipment
42012021

Atmospheric non-exposure multi-sputtering device

42012021 (2).jpg
42012021 (2).jpg
  • Special site - Product/service details - https://pr.mono.ipros.com/shinko-seiki/product/

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basic information

Customized standard sputtering device equipped with a 3-inch cathode and three targets. Comes standard with a dedicated target and glove box. Targets such as Li-based composite oxides and sulfides are also supplied, with paid support for film deposition testing. Follows the basic specifications of a sputtering device with a wealth of research and development experience, capable of depositing films over large areas (φ180) using small-diameter targets. Standard features include a substrate heating heater and substrate water cooling mechanism, enabling a wide range of deposition conditions. Offers a variety of options such as ferromagnetic cathodes, simultaneous sputtering, and load-lock mechanisms to meet diverse requirements for hard materials.

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Applications/Examples of results

Research and development of thin-film solid secondary batteries Research and development of compound semiconductors Research and development of photosensitive materials and optical devices Film formation of low melting point materials

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Atmospheric non-exposure type multi-sputtering device (for thin film solid-state battery research)

Atmospheric non-exposure type multi-sputtering device (for thin film solid-state battery research)

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Batch-type Sputtering Equipment Brochure

Batch-type Sputtering Equipment Brochure

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Multi-purpose sputtering device

Multi-purpose sputtering device

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Company information

神港精機

神港精機 東京支店

Industrial Machinery

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Shinko Seiki, as a technology-driven manufacturer, leverages the numerous know-how accumulated particularly in the field of vacuum equipment to deliver innovative products that meet user needs. In recent years, the company has also been challenging cutting-edge fields such as electronics and new materials, aiming to develop truly valuable hardware and software through the advancement of distinctive technologies and their organic integration.

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