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Our company has been involved in vacuum technology for over 30 years, providing products tailored to user specifications primarily to research institutions. We offer a wide range of vacuum deposition equipment, including the "RF Magnetron Sputtering System," which allows for dual gas introduction, and the "Compact Vacuum Evaporation System," which enables affordable and easy thin film production. Additionally, we have various research equipment available, such as "Vacuum Chambers" and "Turbo Vacuum Pumps." Please feel free to consult us when needed. 【Features】 <Vacuum Deposition Equipment> ■ Designed with consideration for the expandability of the system ■ Engineered to be an economical system ■ Supports target sizes from simple, compact models to those exceeding 1 meter ■ Proven track record across a wide range of fields from experimentation to production *For more details, please refer to the PDF materials or feel free to contact us.
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【Product Lineup (Excerpt)】 <Vacuum Deposition Equipment> ■RF Magnetron Sputtering Equipment ■Opposed Target Sputtering Equipment ■Electron Beam Evaporation Equipment <Various Research Equipment> ■High Vacuum High-Temperature Furnace Equipment ■Substrate Heating Equipment ■Various Current Introduction Terminals *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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The necessity of thin film production in next-generation technologies is increasing more and more. In thin film production, there is a demand for technology that is low-temperature, dense, and also highly productive. Our company has made it possible to implement arc discharge measures that were not achievable with conventional opposing target sputtering methods, and we manufacture and sell uniform plasma sputtering devices that meet the above conditions.
