High-speed semiconductor mask laser drawing device 'ULTRA'
"ULTRA" is a high-speed, high-resolution laser drawing device suitable for semiconductor mask creation. The "ULTRA" is a cost-effective mask drawing device equipped with high productivity, high precision, high uniformity, and ultra-high precision alignment accuracy.
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basic information
【Basic Performance】 ■Minimum Pattern Size: 500nm ■Drawing Speed: 580mm²/min (FX mode), 325mm²/min (QX mode) ■Line Edge Roughness: 20nm (QX mode) ■CD Uniformity: 30nm (QX mode) ■Overlay: 30nm (QX mode) ■Position Accuracy: 40nm (QX mode) ■Maximum Drawing Area: 228mm x 228mm (Optionally up to 400mm x 400mm) ■Auto Loader for Masks *For more details, please refer to the catalog or feel free to contact us.
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Applications/Examples of results
Photomask for semiconductors
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Company information
Heidelberg Instruments, Inc. is the Japanese subsidiary of Heidelberg Instruments Mikrotechnik, a German company that develops and manufactures laser direct writing systems and mask writing systems. We provide sales and technical services for laser direct writing systems within Japan. We offer a wide range of products, including laser writing systems and maskless aligners. For anything related to laser lithography, please feel free to consult with us.