[DL Available/GD-OES Analysis and Measurement] Cleaning Evaluation of Plated Substrates
With GD-OES (Glow Discharge Optical Emission Spectroscopy), you can understand the film thickness and concentration of nickel plating. Please also use it for the analysis of other surface treatments.
Glow Discharge Optical Emission Spectrometry (GD-OES) is a method for analyzing the composition of a sample by sputtering atoms from its surface, exciting those atoms into a plasma state, and measuring the resulting emission. In this case, we will introduce the "investigation of substrate cleaning effects before the plating process" using GD-OES. Please take a moment to read the PDF materials. In addition to this case, our company has numerous analytical achievements related to plating. We also conduct various surface analyses, including XPS and Auger, in addition to GD-OES. If you have any questions, please feel free to consult with us. Seiko Future Creation Official Website https://www.seiko-sfc.co.jp/ *Other materials are also available. If you request through the inquiry button, we will send them to you.
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basic information
●Objective: Investigate the cleaning effect of the substrate before the plating process ●Method: GD-OES (Glow Discharge Optical Emission Spectroscopy) ●Results: A reduction in the C element (carbon) on the surface of the stainless steel substrate confirms the cleaning effect *For more details, please refer to the PDF document or feel free to contact us.*
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For more details, please refer to the PDF document or feel free to contact us.
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Seiko Future Creation Co., Ltd. conducts business centered on contract analysis services, research and development, production technology, and FA systems, providing various services aimed at solving customer challenges. Regarding contract analysis, we have a proven track record of solving issues in the development, manufacturing, and quality assurance processes within the Seiko Group, allowing us to respond comprehensively by anticipating the background in various situations. We can handle samples ranging from million-order to nano-order sizes based on our extensive analytical experience primarily in watches and ICs, as well as in printer-related fields. In particular, we tackle customer challenges "from multiple perspectives and comprehensively" using the following technologies: - Microfabrication using a focused ion beam (FIB) device - Thermal analysis of material properties using differential scanning calorimetry (DSC) and others - Observation of microstructure using scanning probe microscopy (AFM) and others - Surface analysis using various devices (XPS, AES, GD-OES) - Cross-sectional observation and structural analysis using various devices (SEM, TEM) Our engineers are available for direct consultations. If you have any concerns, please feel free to reach out to us. *Seiko Future Creation Co., Ltd. changed its name from Seiko I-Techno Research Co., Ltd. on July 1, 2022.
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