Equipped with an EB source expansion port! Compatible with 4-inch substrates, it features a substrate heating mechanism and a film thickness control mechanism!
This product is a three-source switchable resistance heating vapor deposition device aimed at metal materials. The square chamber improves maintainability. It supports 4-inch substrates and is equipped with a substrate heating mechanism and a film thickness control mechanism. 【Features】 ■ Substrate dimensions: 100×100 ■ Substrate heating temperature: Normal use 600℃ ■ Substrate rotation holder ■ Quartz film thickness gauge ■ EB source expansion port included ■ Resistance heating source: 100A three-source switchable *For more details, please refer to the PDF document or feel free to contact us.
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