No cracks occur due to heat! No particles are generated even after prolonged use!
Our company conducts "semiconductor Kunimite processing." It is effective in reducing the amount of particles generated within semiconductor manufacturing equipment that uses corrosive gases. One of the causes of particle generation is known to be the occurrence of cracks due to thermal effects from plasma, which leads to corrosion and subsequently particle generation. "Kunimite" does not generate cracks due to heat, so particles do not occur even after long-term use in plasma etching equipment. 【Features】 ■ Effective in reducing the amount of particles ■ No occurrence of cracks due to heat ■ No particles generated even after long-term use in plasma etching equipment *For more details, please refer to the PDF document or feel free to contact us.
Inquire About This Product
basic information
【Causes of Particle Generation】 ■ Cracks occur due to thermal effects from plasma ■ Corrosion progresses ■ Particles are generated → Reduction of particle quantity is possible with this processing *For more details, please refer to the PDF document or feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
■ Semiconductor manufacturing equipment, etc. *For more details, please refer to the PDF document or feel free to contact us.
Company information
China Electric Chemical Industry Co., Ltd. is a global company based in Yamaguchi that challenges future technologies. We perform metal surface treatments, including anodizing. With our unique technology, we specialize in surface treatment of aluminum used in semiconductor manufacturing equipment. We are always conscious of carbon neutrality, strive to prevent pollution, and work hard to protect and preserve the global environment.
![[Proposed Solution Example] Decoration for Titanium Seals](https://image.mono.ipros.com/public/product/image/ba2/2000650518/IPROS49489155889364182239.png?w=280&h=280)
