The compatible film types are DLC, amorphous SiC, etc.! Equipped with a substrate heating mechanism (maximum set temperature: 500°C).
We would like to introduce our "Plasma CVD System for 3D Objects" that we handle. This system can deposit films on three-dimensional objects, and compatible film types include DLC and amorphous SiC, among others. It operates via PC control (sequencer control), allowing for fully automated operation and data logging. We design and manufacture equipment tailored to our customers' needs and budgets, from experimental devices to production systems. Please feel free to contact us for inquiries. 【Features】 ■ Experimental plasma CVD system capable of depositing films on three-dimensional objects ■ Compatible film types: DLC, amorphous SiC, etc. ■ Equipped with a substrate heating mechanism (maximum set temperature: 500°C) ■ Fully automated operation and data logging via PC control (sequencer control) *For more details, please refer to the PDF document or feel free to contact us.
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【Specifications (Excerpt)】 ■Chamber Material: Stainless Steel ■Achievable Vacuum Level: Below 1 Pa ■Vacuum Pump: Rotary Pump + Mechanical Booster Pump ■Exhaust Pressure Control: Manual (Automatic option available) ■Film Deposition Target: Maximum Φ100mm × 500mm ■High-Frequency Output: Maximum 1 kW *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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We design and manufacture equipment tailored to our customers' needs, ranging from film deposition devices such as CVD, sputtering, and evaporation systems to experimental and production equipment for both vacuum and atmospheric pressure, including atmospheric plasma and heating/drying furnaces. Additionally, we produce DLC films using the plasma CVD method, which is a type of CVD. We can also create silicon-based films such as a-SiC and SiOx. Please feel free to contact us if you have any inquiries.