Substrate bias mechanism! Introducing our microwave PECVD/etching equipment.
The "scia Cube 300/450/750" is a microwave PECVD/etching device compatible with substrates of 300×300mm, 450×450mm, and 750×750mm. The processes include microwave PECVD and reactive ion etching (RIE). Please feel free to consult us when you need assistance. 【Features】 ■ Compatible with substrates of 300×300mm, 450×450mm, and 750×750mm ■ Substrate bias mechanism ■ Substrate cooling and heating mechanism (-10 to 850℃) *For more details, please refer to the PDF materials or feel free to contact us.
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basic information
【Applications】 ■ PECVD: Insulating films (Si3N4, SiO2, etc.) ■ Optical materials (a-C:H, DLC) ■ Nanocrystalline diamond, carbon nanotubes ■ RIE: Reactive etching (Ni, Cr, Pt, etc.) ■ Optical materials (quartz, fused silica, etc.) *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Our company website features information on used equipment related to FPD and semiconductors. ● Main Business Activities Purchase of used semiconductor manufacturing equipment, refurbishment, sales, and setup operations Construction and consulting for semiconductor manufacturing lines Purchase of used FPD manufacturing equipment, refurbishment, sales, and setup operations Construction and consulting for FPD manufacturing lines Contract development, manufacturing, and sales of semiconductor manufacturing equipment and FPD manufacturing equipment Sales of various equipment parts Agency sales of overseas manufactured equipment
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