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  6. Circuit formation: Ion implantation

Circuit formation: Ion implantation

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last updated:Sep 04, 2023

デュブリン・ジャパン・リミテッド 本社
デュブリン・ジャパン・リミテッド 本社
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Changing the electrical characteristics of the exposed surface! Introducing the formation of semiconductor circuits.

We would like to introduce "ion implantation" in our semiconductor circuit formation. "Ion implantation" is used multiple times during chip manufacturing to form semiconductor devices. During ion implantation, the wafer is impacted by a beam of charged ions called dopants, which changes the electrical characteristics of the exposed surface. 【Features】 ■ Used multiple times during chip manufacturing to form semiconductor devices ■ Changes the electrical characteristics of the exposed surface *For more details, please refer to the related links or feel free to contact us.

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Circuit formation: Ion implantation

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08.PNG
  • Related Link - https://www.deublin.com/ja-JP/Industries/Semicondu…

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デュブリン・ジャパン・リミテッド

デュブリン・ジャパン・リミテッド 本社

Machine elements and parts

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Since our establishment in 1945, we have maintained the philosophy of providing our customers with the best products as a dedicated manufacturer of rotary joints. In recent years, we have also created unique products based on our original design concepts in slip rings, which facilitate the exchange of electrical signals, data, and power in rotating bodies. To realize our customers' visions, we will propose strong solutions through our skilled engineering team and modern manufacturing facilities. We will provide the best products that truly satisfy our users. We have launched a Japanese website. https://www.deublin.com/ja-JP/

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