We have a variety of injection devices ranging from low energy up to 8 MeV.
We take pride in our top-level technology and equipment for ion implantation at room temperature, as well as high-temperature ion implantation, which only a few companies in the world can handle. Our company can perform implantation processing under various conditions tailored to customer requests, ranging from chip fragments to 300 mm (12-inch) diameter wafers. Implantation conditions can range from 10 to 8,000 KeV, from room temperature to high-temperature heating (600°C), and we can accommodate approximately 60 types of ion species.
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basic information
For more details, please refer to the PDF document or feel free to contact us.
Price information
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Delivery Time
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Applications/Examples of results
Ion implantation for semiconductors is widely used by domestic companies and universities.
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Company information
The Ion Tech Center is a professional group that provides consulting and technical development support in "ion implantation," "physical analysis," and research and development. We aim to be a good partner for companies and university researchers as a creative laboratory equipped with cutting-edge technology and facilities that meet the demands of the times.
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