Industrial Microscope USPM-RU-W (EVIDENT)

basic information

This single device enables various spectral measurements such as reflectance, film thickness, object color, transmittance, and reflectance at an incident angle of 45 degrees. ◆ Reflectance Measurement It is optimal for measuring the reflectance of small spots with a diameter of 17 to 70 μm, focused by an objective lens, with high speed and precision, making it suitable for measuring curved surfaces of fine electronic components and lenses. Using a rotating stage allows for easy measurement of the reflectance around the lens periphery. ◆ Film Thickness Measurement Using reflectance data, it measures the thickness of single-layer films and multi-layer films ranging from approximately 50 nm to about 10 μm. ◆ Object Color Measurement It displays the XY chromaticity diagram, L*a*b* chromaticity diagram, and related values derived from reflectance data. ◆ Transmittance Measurement (Optional) By transmitting parallel light with a diameter of 2 mm from below the stage, it measures the transmittance of flat samples. When equipped with a polarization element unit, it also supports P-polarized and S-polarized measurements. ◆ Reflectance Measurement at an Incident Angle of 45 Degrees (Optional) It measures reflectance by reflecting parallel light with a diameter of 2 mm from the side onto a 45-degree surface. When equipped with a polarization element unit, it also supports P-polarized and S-polarized measurements.

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Detailed information

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  High-speed and high-precision measurement of curved surfaces and small areas achieved ◆ High-speed measurement realized High-speed measurement is achieved through simultaneous spectral measurement of all wavelengths using a flat-field grating and a lens sensor. ◆ Ideal for measuring the reflectance of fine parts and lenses A newly designed dedicated objective lens enables non-contact measurement in an area of Φ17 to 70μm. This allows for highly reproducible measurements even on curved surfaces of fine electronic components and lenses that cannot be measured with conventional spectrophotometers. ◆ No anti-reflection treatment needed for back surface reflections during reflectance measurement By combining the dedicated objective lens with a ring band proof, reflectance as low as 0.2mm can be measured without the need for anti-reflection treatment on the back surface of the specimen. ◆ Selectable film thickness measurement methods Film thickness analysis of carbon films and multilayer films is performed based on the selected spectral reflectance data. The optimal measurement method can be chosen according to the application. ◆ Peak-valley method This method calculates film thickness from the periodicity of the peaks and valleys of the measured spectral reflectance values, making it effective for single-layer film measurements. It can be easily obtained without complex settings.

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  We respond to diversifying measurement needs with high speed and high precision. ◆ For the evaluation of coatings through reflectance measurement of optical elements such as spherical and aspherical lenses, filters, and mirrors, as well as object color measurement and film thickness measurement. Digital camera lenses, project lenses, pickup lenses, eyeglass lenses ◆ For reflectance measurement and film thickness measurement of microelectronic components such as LED reflectors and semiconductor substrates. LED packages, semiconductor substrates ◆ For reflectance measurement, film thickness measurement, and transmittance measurement of planar optical elements, color filters, and optical films. Liquid crystal color filters, optical films ◆ For reflectance measurement at 45-degree incidence using prisms and mirrors. Prisms, mirrors