Production ion beam milling equipment that achieves high rate and high reliability.
The ion beam etching equipment manufactured by AVP Technology is a production device equipped with an ICP ion source, offering high uniformity, high etching rates, and excellent operational reproducibility and stability. Compared to other companies' IBE devices, it achieves stable operation, which is essential for manufacturing facilities, through its superior control system. The latest drive mechanism minimizes latency time, thereby improving productivity.
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basic information
Features Uniform etching on an 8-inch substrate using the latest grid design Improved continuous operation of high-rate etching through optimization of the ion source cooling mechanism Increased speed of the substrate holding section's tilting mechanism compared to direct drive methods Stable operation of the equipment achieved through the adoption of the latest OS and improvements in the control system Flexible software configuration allowing docking of third-party process modules
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Applications/Examples of results
Main Applications - PZT film etching and milling - Microfabrication, patterning, and molding - Communication and microwave components - Hard disk drives, MRAM, and other magnetic devices - Optical sensors - MEMS circuits and sensors
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Product specifications
Company information
For semiconductor, electronic devices, and optical thin film manufacturing equipment, come to us. Our company was established in March 2016 with the aim of providing agency services for several overseas manufacturers with advanced technologies related to vacuum processes, as well as maintenance services for these devices. Our product lineup includes a wide range of equipment such as sputtering, high-density plasma sources and pulse power supplies, ion beam etching and milling, ion beam sputtering, neutral cluster ion beam process equipment, organic material sublimation purification and film deposition equipment, various filters for liquids, and cleaning brushes, among others.
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